Harris-Lee, T.R.; Brookes, A.; Zhang, J.; Bentley, C.L.; Marken, F.; Johnson, A.L.
Plasma-Enhanced Atomic Layer Deposition of Hematite for Photoelectrochemical Water Splitting Applications. Crystals 2024, 14, 723.
https://doi.org/10.3390/cryst14080723
AMA Style
Harris-Lee TR, Brookes A, Zhang J, Bentley CL, Marken F, Johnson AL.
Plasma-Enhanced Atomic Layer Deposition of Hematite for Photoelectrochemical Water Splitting Applications. Crystals. 2024; 14(8):723.
https://doi.org/10.3390/cryst14080723
Chicago/Turabian Style
Harris-Lee, Thom R., Andrew Brookes, Jie Zhang, Cameron L. Bentley, Frank Marken, and Andrew L. Johnson.
2024. "Plasma-Enhanced Atomic Layer Deposition of Hematite for Photoelectrochemical Water Splitting Applications" Crystals 14, no. 8: 723.
https://doi.org/10.3390/cryst14080723
APA Style
Harris-Lee, T. R., Brookes, A., Zhang, J., Bentley, C. L., Marken, F., & Johnson, A. L.
(2024). Plasma-Enhanced Atomic Layer Deposition of Hematite for Photoelectrochemical Water Splitting Applications. Crystals, 14(8), 723.
https://doi.org/10.3390/cryst14080723