Narimisa, M.; Krčma, F.; Onyshchenko, Y.; Kozáková, Z.; Morent, R.; De Geyter, N.
Atmospheric Pressure Microwave Plasma Jet for Organic Thin Film Deposition. Polymers 2020, 12, 354.
https://doi.org/10.3390/polym12020354
AMA Style
Narimisa M, Krčma F, Onyshchenko Y, Kozáková Z, Morent R, De Geyter N.
Atmospheric Pressure Microwave Plasma Jet for Organic Thin Film Deposition. Polymers. 2020; 12(2):354.
https://doi.org/10.3390/polym12020354
Chicago/Turabian Style
Narimisa, Mehrnoush, František Krčma, Yuliia Onyshchenko, Zdenka Kozáková, Rino Morent, and Nathalie De Geyter.
2020. "Atmospheric Pressure Microwave Plasma Jet for Organic Thin Film Deposition" Polymers 12, no. 2: 354.
https://doi.org/10.3390/polym12020354
APA Style
Narimisa, M., Krčma, F., Onyshchenko, Y., Kozáková, Z., Morent, R., & De Geyter, N.
(2020). Atmospheric Pressure Microwave Plasma Jet for Organic Thin Film Deposition. Polymers, 12(2), 354.
https://doi.org/10.3390/polym12020354