Yang, X.; Gu, M.; Wei, Q.; Zhang, Y.; Wu, S.; Wu, Q.; Hu, X.; Zhao, W.; Zhou, G.
Photo-Embossed Surface Relief Structures with Improved Aspect Ratios and Their Applications in Liquid Crystal Devices. Polymers 2022, 14, 171.
https://doi.org/10.3390/polym14010171
AMA Style
Yang X, Gu M, Wei Q, Zhang Y, Wu S, Wu Q, Hu X, Zhao W, Zhou G.
Photo-Embossed Surface Relief Structures with Improved Aspect Ratios and Their Applications in Liquid Crystal Devices. Polymers. 2022; 14(1):171.
https://doi.org/10.3390/polym14010171
Chicago/Turabian Style
Yang, Xiulan, Minzhao Gu, Qunmei Wei, Yang Zhang, Sihan Wu, Qin Wu, Xiaowen Hu, Wei Zhao, and Guofu Zhou.
2022. "Photo-Embossed Surface Relief Structures with Improved Aspect Ratios and Their Applications in Liquid Crystal Devices" Polymers 14, no. 1: 171.
https://doi.org/10.3390/polym14010171
APA Style
Yang, X., Gu, M., Wei, Q., Zhang, Y., Wu, S., Wu, Q., Hu, X., Zhao, W., & Zhou, G.
(2022). Photo-Embossed Surface Relief Structures with Improved Aspect Ratios and Their Applications in Liquid Crystal Devices. Polymers, 14(1), 171.
https://doi.org/10.3390/polym14010171