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Polymers
Volume 16
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10.3390/polym16172452
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Article

Antimicrobial Coatings Based on a Photoreactive (Meth)acrylate Syrup and Ferulic Acid—The Effectiveness against Staphylococcus epidermidis

by
Agnieszka Kowalczyk
1,*,
Agata Kraśkiewicz
1,*,
Agata Markowska-Szczupak
2 and
Krzysztof Kowalczyk
1
1
Department of Chemical Organic Technology and Polymeric Materials, Faculty of Chemical Technology and Engineering, West Pomeranian University of Technology in Szczecin, 70-322 Szczecin, Poland
2
Department of Chemical and Process Engineering, Faculty of Chemical Technology and Engineering, West Pomeranian University of Technology in Szczecin, 71-065 Szczecin, Poland
*
Authors to whom correspondence should be addressed.
Polymers 2024, 16(17), 2452; https://doi.org/10.3390/polym16172452
Submission received: 26 July 2024 / Revised: 22 August 2024 / Accepted: 26 August 2024 / Published: 29 August 2024
(This article belongs to the Section Polymer Chemistry)
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Abstract

A novel photopolymerizable (meth)acrylate oligomer syrup modified with ferulic acid (FA) was verified as an antimicrobial coating binder against a biofilm of Staphylococcus epidermidis. A solution-free UV-LED-initiated photopolymerization process of aliphatic (meth)acrylates and styrene was performed to prepare the oligomer syrup. The influence of ferulic acid on the UV crosslinking process of the varnish coatings (kinetic studies using photo-DSC) as well as their chemical structure (FTIR) and mechanical (adhesion, hardness), optical (gloss, DOI parameter), and antibacterial properties against S. epidermidis were investigated. The photo-DSC results revealed that FA has a positive effect on reducing the early occurrence of slowing processes and has a favorable effect on the monomer conversion increment. It turned out, unexpectedly, that the more FA in the coating, the greater its adhesion to a glass substrate and hardness. The coating containing 0.9 wt. part of FA exhibited excellent antimicrobial properties against S. epidermidis, i.e., the bacterial number after 24 h was only 1.98 log CFU/mL. All the coatings showed relatively high hardness, gloss (>80 G.U.), and DOI parameter values (30–50 a.u.).
Keywords: ferulic acid; (meth)acrylate; varnish; photopolymerization; antimicrobial coating ferulic acid; (meth)acrylate; varnish; photopolymerization; antimicrobial coating

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MDPI and ACS Style

Kowalczyk, A.; Kraśkiewicz, A.; Markowska-Szczupak, A.; Kowalczyk, K. Antimicrobial Coatings Based on a Photoreactive (Meth)acrylate Syrup and Ferulic Acid—The Effectiveness against Staphylococcus epidermidis. Polymers 2024, 16, 2452. https://doi.org/10.3390/polym16172452

AMA Style

Kowalczyk A, Kraśkiewicz A, Markowska-Szczupak A, Kowalczyk K. Antimicrobial Coatings Based on a Photoreactive (Meth)acrylate Syrup and Ferulic Acid—The Effectiveness against Staphylococcus epidermidis. Polymers. 2024; 16(17):2452. https://doi.org/10.3390/polym16172452

Chicago/Turabian Style

Kowalczyk, Agnieszka, Agata Kraśkiewicz, Agata Markowska-Szczupak, and Krzysztof Kowalczyk. 2024. "Antimicrobial Coatings Based on a Photoreactive (Meth)acrylate Syrup and Ferulic Acid—The Effectiveness against Staphylococcus epidermidis" Polymers 16, no. 17: 2452. https://doi.org/10.3390/polym16172452

APA Style

Kowalczyk, A., Kraśkiewicz, A., Markowska-Szczupak, A., & Kowalczyk, K. (2024). Antimicrobial Coatings Based on a Photoreactive (Meth)acrylate Syrup and Ferulic Acid—The Effectiveness against Staphylococcus epidermidis. Polymers, 16(17), 2452. https://doi.org/10.3390/polym16172452

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