Liu, S.; Wu, J.; Chen, Y.; Zhang, T.; Tong, L.; Liu, X.
Polyarylene Ether Nitrile/Modified Hollow Silica Composite Films for Ultralow Dielectric Properties and Enhanced Thermal Resistance. Polymers 2025, 17, 1623.
https://doi.org/10.3390/polym17121623
AMA Style
Liu S, Wu J, Chen Y, Zhang T, Tong L, Liu X.
Polyarylene Ether Nitrile/Modified Hollow Silica Composite Films for Ultralow Dielectric Properties and Enhanced Thermal Resistance. Polymers. 2025; 17(12):1623.
https://doi.org/10.3390/polym17121623
Chicago/Turabian Style
Liu, Shuning, Jinqi Wu, Yani Chen, Ting Zhang, Lifen Tong, and Xiaobo Liu.
2025. "Polyarylene Ether Nitrile/Modified Hollow Silica Composite Films for Ultralow Dielectric Properties and Enhanced Thermal Resistance" Polymers 17, no. 12: 1623.
https://doi.org/10.3390/polym17121623
APA Style
Liu, S., Wu, J., Chen, Y., Zhang, T., Tong, L., & Liu, X.
(2025). Polyarylene Ether Nitrile/Modified Hollow Silica Composite Films for Ultralow Dielectric Properties and Enhanced Thermal Resistance. Polymers, 17(12), 1623.
https://doi.org/10.3390/polym17121623