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Journal: Atmosphere, 2020
Volume: 11
Number: 464

Article: Arsenic Exposure and Methylation Efficiency in Relation to Oxidative Stress in Semiconductor Workers
Authors: by Chih-Hong Pan, Ching-Yu Lin, Ching-Huang Lai and Hueiwang Anna Jeng
Link: https://www.mdpi.com/2073-4433/11/5/464

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