Direct Current Annealing Modulated Ordered Structure to Optimize Tensile Mechanical Properties of Co-Based Amorphous Metallic Microwires
Abstract
:1. Introduction
2. Materials and Methods
3. Results and Discussion
3.1. Direct Current Annealing and Structure Characteristic
3.2. Tensile Properties and Fracture Morphology of Co-Based Metallic Microwires
3.3. Fracture Reliability Analysis of Co-Based Metallic Microwires
4. Conclusions
- (1)
- Direct current-annealing can promote the formation of nanoclusters in the amorphous structure of Co-based metallic microwires, and with the rising of the annealing current intensity, whose content increases, the distribution tends to be concentrated from dispersion;
- (2)
- Direct current-annealing with appropriate strength can effectively improve the tensile strength and elongation at the break of Co-based metallic microwires, and also enhance their fracture reliability. The 90 mA current-annealed metallic microwires have excellent tensile mechanical properties, the tensile strength and elongation at break are 4540.10 MPa and 2.99%, respectively, and the fracture threshold is 1910.90 MPa;
- (3)
- The way to improve the tensile mechanical properties of Co-based metallic microwires is to control the content and distribution of the nanoclusters. The small and uniformly distributed nanoclusters can hinder the expansion of shear bands, while the larger and concentrated nanoclusters may become the initiation points of shear bands and accelerate the generation of cracks.
Author Contributions
Funding
Institutional Review Board Statement
Informed Consent Statement
Data Availability Statement
Conflicts of Interest
References
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Elements | Contents (at.%) |
---|---|
Co | 69.25 |
Fe | 4.25 |
Si | 13.00 |
B | 12.50 |
Nd | 1.00 |
Fitting Type | As-Cast | 65 mA | 90 mA | 150 mA | |
---|---|---|---|---|---|
Weibull Statistics | Two-parameter | m = 9.89 | m = 7.42 | m = 8.40 | m = 2.23 |
Three-parameter | m = 6.74 | m = 4.33 | m = 4.00 | m = 1.52 | |
σμ = 1145.27 MPa | σμ = 1470.49 MPa | σμ = 1910.90 MPa | σμ = 473.35 MPa | ||
Log-normal Plotting | s = 0.12237 | s = 0.15362 | s = 0.14866 | s = 0.54660 | |
k = 8.22818 | k = 8.25716 | k = 8.25259 | k = 7.48855 |
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Wang, C.; Cao, G.; Liu, J.; Zhang, Y.; Liu, R.; Wang, F.; Zhang, M.; Wang, L.; Zhang, B. Direct Current Annealing Modulated Ordered Structure to Optimize Tensile Mechanical Properties of Co-Based Amorphous Metallic Microwires. Metals 2022, 12, 1427. https://doi.org/10.3390/met12091427
Wang C, Cao G, Liu J, Zhang Y, Liu R, Wang F, Zhang M, Wang L, Zhang B. Direct Current Annealing Modulated Ordered Structure to Optimize Tensile Mechanical Properties of Co-Based Amorphous Metallic Microwires. Metals. 2022; 12(9):1427. https://doi.org/10.3390/met12091427
Chicago/Turabian StyleWang, Congliang, Guanyu Cao, Jingshun Liu, Yun Zhang, Rui Liu, Feng Wang, Mingwei Zhang, Lu Wang, and Bo Zhang. 2022. "Direct Current Annealing Modulated Ordered Structure to Optimize Tensile Mechanical Properties of Co-Based Amorphous Metallic Microwires" Metals 12, no. 9: 1427. https://doi.org/10.3390/met12091427