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Proust V, Kirscher Q, Nguyen TKN, Obringer L, Ishii K, Rault L, Demange V, Berthebaud D, Ohashi N, Uchikoshi T, et al. Hafnium Oxide Nanostructured Thin Films: Electrophoretic Deposition Process and DUV Photolithography Patterning. Nanomaterials. 2022; 12(14):2334. https://doi.org/10.3390/nano12142334

Proust, Vanessa, Quentin Kirscher, Thi Kim Ngan Nguyen, Lisa Obringer, Kento Ishii, Ludivine Rault, Valérie Demange, David Berthebaud, Naoki Ohashi, Tetsuo Uchikoshi, and et al. 2022. "Hafnium Oxide Nanostructured Thin Films: Electrophoretic Deposition Process and DUV Photolithography Patterning" Nanomaterials 12, no. 14: 2334. https://doi.org/10.3390/nano12142334

Proust, V., Kirscher, Q., Nguyen, T. K. N., Obringer, L., Ishii, K., Rault, L., Demange, V., Berthebaud, D., Ohashi, N., Uchikoshi, T., Berling, D., Soppera, O., & Grasset, F. (2022). Hafnium Oxide Nanostructured Thin Films: Electrophoretic Deposition Process and DUV Photolithography Patterning. Nanomaterials, 12(14), 2334. https://doi.org/10.3390/nano12142334