Purification and Nitrogen Doping of Nanothin Exfoliated Graphite Through RF Thermal Plasma Treatment
Abstract
:1. Introduction
2. Experimental Details
2.1. Materials
2.2. Configuration of the RF Plasma System
2.3. Synthesis of Nitrogen-Doped NTE Graphite
3. Results and Discussion
3.1. Analysis of N-Doped NTE Graphite and Untreated NTE Graphite
3.2. Electrical Performance of the N-Doped NTE Graphite Sheet
3.3. N Doping Process in the RF Thermal Plasma System
4. Conclusions
Author Contributions
Funding
Acknowledgments
Conflicts of Interest
References
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Plate Power | Plasma Forming Gas | Raw Material | Feeding Rate of Raw Material | Carrier Gas | |
---|---|---|---|---|---|
Central Gas | Sheath Gas | ||||
30 kW | 30 L/min Ar | 50 L/min Ar | Mixed powder 1 of NTE graphite and CO(NH2)2 | 1 kg/h | 10 L/min Ar |
Materials | Elements (wt%) | |||
---|---|---|---|---|
C | N | H | S | |
Untreated NTE graphite | 91.73 | 0.83 | 0.29 | 0.59 |
N-doped NTE graphite | 90.85 | 3.99 | 0.48 | - |
Materials | Bonding Structure | Total | ||
---|---|---|---|---|
Pyrrolic | Pyridinic | Quaternary | ||
Untreated NTE graphite | 0.18 | - | 0.18 | 0.36 |
N-doped NTE graphite | 0.26 | 1.28 | 0.26 | 1.79 |
Materials | Sheet Resistance (Rs, mΩ/sq) | |||||||
1 | 2 | 3 | 4 | 5 | 6 | 7 | 8 | |
Untreated NTE Graphite + Hot PRESS | 80.34 | 80.7 | 75.37 | 74.88 | 77.36 | 79.51 | 71.17 | 72.33 |
N-doped NTE Graphite + Hot PRESS | 58.63 | 62.56 | 65 | 74.48 | 67.34 | 62.23 | 71.68 | 64.48 |
Untreated NTE Graphite + Roll Process | 78.77 | 75.41 | 74.32 | 76.09 | 79.55 | 80.92 | 72.33 | 82.93 |
N-doped NTE Graphite + Roll Process | 58.21 | 62.97 | 59.88 | 63.73 | 63.73 | 64.98 | 68.36 | 62.43 |
Materials | Average Rs (mΩ/sq) | Thickness (μm) | Calibrated Rs (mΩ/sq at 100 μm) | Resistivity (Ω m) | ||||
Untreated NTE Graphite + Hot PRESS | 76.46 | 113 | 86.40 | 8.63 × 10−6 | ||||
N-doped NTE Graphite + Hot PRESS | 65.80 | 115.8 | 76.20 | 7.61 × 10−6 | ||||
Untreated NTE Graphite + Roll Process | 77.54 | 111 | 86.07 | 8.60 × 10−6 | ||||
N-doped NTE Graphite + Roll Process | 63.04 | 107.5 | 67.76 | 6.77 × 10−6 |
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Son, B.-K.; Lee, K.-H.; Kim, T.-H.; Shin, M.-S.; Choi, S.-Y.; Cho, G. Purification and Nitrogen Doping of Nanothin Exfoliated Graphite Through RF Thermal Plasma Treatment. Nanomaterials 2019, 9, 995. https://doi.org/10.3390/nano9070995
Son B-K, Lee K-H, Kim T-H, Shin M-S, Choi S-Y, Cho G. Purification and Nitrogen Doping of Nanothin Exfoliated Graphite Through RF Thermal Plasma Treatment. Nanomaterials. 2019; 9(7):995. https://doi.org/10.3390/nano9070995
Chicago/Turabian StyleSon, Byung-Koo, Kyu-Hang Lee, Tae-Hee Kim, Myung-Sun Shin, Sun-Yong Choi, and Guangsup Cho. 2019. "Purification and Nitrogen Doping of Nanothin Exfoliated Graphite Through RF Thermal Plasma Treatment" Nanomaterials 9, no. 7: 995. https://doi.org/10.3390/nano9070995