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Journal: Coatings, 2020
Volume: 10
Number: 637
Article:
Plasma Etching Behavior of SF6 Plasma Pre-Treatment Sputter-Deposited Yttrium Oxide Films
Authors:
by
Wei-Kai Wang, Sung-Yu Wang, Kuo-Feng Liu, Pi-Chuen Tsai, Yu-Hao Zhang and Shih-Yung Huang
Link:
https://www.mdpi.com/2079-6412/10/7/637
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