Electrochemical Properties of TiWN/TiWC Multilayer Coatings Deposited by RF-Magnetron Sputtering on AISI 1060
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González-Hernández, A.; Morales-Cepeda, A.B.; Flores, M.; Caicedo, J.C.; Aperador, W.; Amaya, C. Electrochemical Properties of TiWN/TiWC Multilayer Coatings Deposited by RF-Magnetron Sputtering on AISI 1060. Coatings 2021, 11, 797. https://doi.org/10.3390/coatings11070797
González-Hernández A, Morales-Cepeda AB, Flores M, Caicedo JC, Aperador W, Amaya C. Electrochemical Properties of TiWN/TiWC Multilayer Coatings Deposited by RF-Magnetron Sputtering on AISI 1060. Coatings. 2021; 11(7):797. https://doi.org/10.3390/coatings11070797
Chicago/Turabian StyleGonzález-Hernández, Andrés, Ana Beatriz Morales-Cepeda, Martín Flores, Julio C. Caicedo, William Aperador, and César Amaya. 2021. "Electrochemical Properties of TiWN/TiWC Multilayer Coatings Deposited by RF-Magnetron Sputtering on AISI 1060" Coatings 11, no. 7: 797. https://doi.org/10.3390/coatings11070797
APA StyleGonzález-Hernández, A., Morales-Cepeda, A. B., Flores, M., Caicedo, J. C., Aperador, W., & Amaya, C. (2021). Electrochemical Properties of TiWN/TiWC Multilayer Coatings Deposited by RF-Magnetron Sputtering on AISI 1060. Coatings, 11(7), 797. https://doi.org/10.3390/coatings11070797