Next Article in Journal
N-Doped and Sulfonated Reduced Graphene Oxide Supported PtNi Nanoparticles as Highly Efficient Electrocatalysts for Oxygen Reduction Reaction
Next Article in Special Issue
Structure, Microstructure, and Dielectric Response of Polycrystalline Sr1-xZnxTiO3 Thin Films
Previous Article in Journal
Improvement of the Mechanical Properties and Corrosion Resistance of CSS-42L Steel with a Novel TiAlMoNbW Nitrid Film Deposition
Previous Article in Special Issue
Tantalum-Titanium Oxynitride Thin Films Deposited by DC Reactive Magnetron Co-Sputtering: Mechanical, Optical, and Electrical Characterization
 
 
Search for Articles:
Title / Keyword
Author / Affiliation / Email
Journal
Article Type
 
 
Advanced Search
 
Section
Special Issue
Volume
Issue
Number
Page
 
Journals
Coatings
Volume 12
Issue 8
10.3390/coatings12081050
Review Report
coatings-logo
Submit to this Journal Review for this Journal Propose a Special Issue
► Article Menu

Article Menu

share Share announcement Help format_quote Cite question_answer Discuss in SciProfiles
Article
Peer-Review Record

Influence of Oxygen Flow Rate on the Properties of FeOXNY Films Obtained by Magnetron Sputtering at High Nitrogen Pressure

Coatings 2022, 12(8), 1050; https://doi.org/10.3390/coatings12081050
by Moussa Grafoute 1,*, Kouamé Boko Joël-Igor N’Djoré 1, Carine Petitjean 2, Jean François Pierson 2 and Christophe Rousselot 3,*
Reviewer 1:
Aleksei V. Almaev
Reviewer 2: Anonymous
Coatings 2022, 12(8), 1050; https://doi.org/10.3390/coatings12081050
Submission received: 27 June 2022 / Revised: 16 July 2022 / Accepted: 18 July 2022 / Published: 25 July 2022
(This article belongs to the Special Issue Recent Advances in the Development of Thin Films)

Round 1

Reviewer 1 Report

The manuscript corresponds to the topics of the Coatings. The manuscript has written at a high level. Many experimental methods were used. Before publishing, it is necessary to take into account the following comments:

1. What is the interest in the study of oxynitride and nitride films of iron? Practical applications of these films?

2. I suggest that the authors should compare the characteristics of oxynitride and nitride films of iron obtained by various PVD methods in the form of a table.

3. What is "DRX analysis"? There's probably a typo here.

4. Pay attention to ln.161, 162 and 173.

5. What is the thickness of the films?

6. What type of conductivity of films with semiconductor characteristics is?

7. What defect or impurity does cause such values of activation energies? Why does the activation energy of conductivity depend on oxygen pressure?

8. Present and describe the temperature dependences of resistivity for oxynitride and nitride films of iron.

Author Response

Responses to reviewer comments are given in the attached file

Author Response File: Author Response.docx

Reviewer 2 Report

The authors of manuscript entitled " Influence of oxygen flow rate on the properties of FeOxNy films obtained by magnetron sputtering at high nitrogen pressure", proposed effect of oxygen content on crystal structure of iron oxide by magnetron sputtering.

In this work, authors synthesize different crystal structures of Fe-O-N thin films under different oxygen concentrations, such asγ’’-FeN, α-Fe2O3, and γ-Fe2O3/Fe3O4. And their electrical and optical properties are studied. Optical direct and indirect gaps have been also obtained. It is interesting. I would like to suggest that authors revise the manuscript according to a few questions as follow.

1.     Figure 4c is not mentioned in the text.

2.     There's no any literature from the last ten years (2011-2022). Why?

There is lack of TEM (and Selected Area Electron Diffraction) or STM images which can characterize atomic structure directly.

Author Response

Please see the attachment

Author Response File: Author Response.docx

Round 2

Reviewer 1 Report

The authors took into account the reviewer's comments. The manuscript can be accepted for publication.

Back to TopTop