Walkiewicz-Pietrzykowska, A.; Jankowski, K.; Brzozowski, R.; Zakrzewska, J.; Uznański, P.
Silicon Oxycarbide Coatings Produced by Remote Hydrogen Plasma CVD Process from Cyclic Tetramethylcyclotetrasiloxane. Coatings 2025, 15, 1179.
https://doi.org/10.3390/coatings15101179
AMA Style
Walkiewicz-Pietrzykowska A, Jankowski K, Brzozowski R, Zakrzewska J, Uznański P.
Silicon Oxycarbide Coatings Produced by Remote Hydrogen Plasma CVD Process from Cyclic Tetramethylcyclotetrasiloxane. Coatings. 2025; 15(10):1179.
https://doi.org/10.3390/coatings15101179
Chicago/Turabian Style
Walkiewicz-Pietrzykowska, Agnieszka, Krzysztof Jankowski, Romuald Brzozowski, Joanna Zakrzewska, and Paweł Uznański.
2025. "Silicon Oxycarbide Coatings Produced by Remote Hydrogen Plasma CVD Process from Cyclic Tetramethylcyclotetrasiloxane" Coatings 15, no. 10: 1179.
https://doi.org/10.3390/coatings15101179
APA Style
Walkiewicz-Pietrzykowska, A., Jankowski, K., Brzozowski, R., Zakrzewska, J., & Uznański, P.
(2025). Silicon Oxycarbide Coatings Produced by Remote Hydrogen Plasma CVD Process from Cyclic Tetramethylcyclotetrasiloxane. Coatings, 15(10), 1179.
https://doi.org/10.3390/coatings15101179