Kiełczawa, S.; Wiatrowski, A.; Mazur, M.; Posadowski, W.; Domaradzki, J.
Application of Two-Element Zn-Al Metallic Target for Deposition of Aluminum-Doped Zinc Oxide—Analysis of Sputtering Process and Properties of Obtained Transparent Conducting Films. Coatings 2025, 15, 713.
https://doi.org/10.3390/coatings15060713
AMA Style
Kiełczawa S, Wiatrowski A, Mazur M, Posadowski W, Domaradzki J.
Application of Two-Element Zn-Al Metallic Target for Deposition of Aluminum-Doped Zinc Oxide—Analysis of Sputtering Process and Properties of Obtained Transparent Conducting Films. Coatings. 2025; 15(6):713.
https://doi.org/10.3390/coatings15060713
Chicago/Turabian Style
Kiełczawa, Szymon, Artur Wiatrowski, Michał Mazur, Witold Posadowski, and Jarosław Domaradzki.
2025. "Application of Two-Element Zn-Al Metallic Target for Deposition of Aluminum-Doped Zinc Oxide—Analysis of Sputtering Process and Properties of Obtained Transparent Conducting Films" Coatings 15, no. 6: 713.
https://doi.org/10.3390/coatings15060713
APA Style
Kiełczawa, S., Wiatrowski, A., Mazur, M., Posadowski, W., & Domaradzki, J.
(2025). Application of Two-Element Zn-Al Metallic Target for Deposition of Aluminum-Doped Zinc Oxide—Analysis of Sputtering Process and Properties of Obtained Transparent Conducting Films. Coatings, 15(6), 713.
https://doi.org/10.3390/coatings15060713
