Article Versions Notes

Lv Q, Huang M, Zhang S, Deng S, Gong F, Wang F, Pan Y, Li G, Jin Y. Effects of Annealing on Residual Stress in Ta₂O₅ Films Deposited by Dual Ion Beam Sputtering. Coatings. 2018; 8(4):150. https://doi.org/10.3390/coatings8040150

Lv, Qipeng, Mingliang Huang, Shaoqian Zhang, Songwen Deng, Faquan Gong, Feng Wang, Yanwei Pan, Gang Li, and Yuqi Jin. 2018. "Effects of Annealing on Residual Stress in Ta₂O₅ Films Deposited by Dual Ion Beam Sputtering" Coatings 8, no. 4: 150. https://doi.org/10.3390/coatings8040150

Lv, Q., Huang, M., Zhang, S., Deng, S., Gong, F., Wang, F., Pan, Y., Li, G., & Jin, Y. (2018). Effects of Annealing on Residual Stress in Ta₂O₅ Films Deposited by Dual Ion Beam Sputtering. Coatings, 8(4), 150. https://doi.org/10.3390/coatings8040150