Sun, H.; Chen, S.-C.; Peng, W.-C.; Wen, C.-K.; Wang, X.; Chuang, T.-H.
The Influence of Oxygen Flow Ratio on the Optoelectronic Properties of p-Type Ni1−xO Films Deposited by Ion Beam Assisted Sputtering. Coatings 2018, 8, 168.
https://doi.org/10.3390/coatings8050168
AMA Style
Sun H, Chen S-C, Peng W-C, Wen C-K, Wang X, Chuang T-H.
The Influence of Oxygen Flow Ratio on the Optoelectronic Properties of p-Type Ni1−xO Films Deposited by Ion Beam Assisted Sputtering. Coatings. 2018; 8(5):168.
https://doi.org/10.3390/coatings8050168
Chicago/Turabian Style
Sun, Hui, Sheng-Chi Chen, Wen-Chi Peng, Chao-Kuang Wen, Xin Wang, and Tung-Han Chuang.
2018. "The Influence of Oxygen Flow Ratio on the Optoelectronic Properties of p-Type Ni1−xO Films Deposited by Ion Beam Assisted Sputtering" Coatings 8, no. 5: 168.
https://doi.org/10.3390/coatings8050168
APA Style
Sun, H., Chen, S. -C., Peng, W. -C., Wen, C. -K., Wang, X., & Chuang, T. -H.
(2018). The Influence of Oxygen Flow Ratio on the Optoelectronic Properties of p-Type Ni1−xO Films Deposited by Ion Beam Assisted Sputtering. Coatings, 8(5), 168.
https://doi.org/10.3390/coatings8050168