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Journal: Electronics, 2023
Volume: 12
Number: 4347

Article: Fluorine-Based Low-Damage Selective Etching Process for E-Mode p-GaN/AlGaN/GaN HFET Fabrication
Authors: by Hyeon-Ji Kim, Jun-Hyeok Yim, Hyungtak Kim and Ho-Young Cha
Link: https://www.mdpi.com/2079-9292/12/20/4347

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