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Photonics
Volume 11
Issue 12
10.3390/photonics11121200
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This is an early access version, the complete PDF, HTML, and XML versions will be available soon.
Article

Considering Grayscale Process and Material Properties for Robust Multilevel Diffractive Flat Optics

by
Diogo E. Aguiam
*,
Ana Dias
,
Manuel J. L. F. Rodrigues
,
Aamod Shanker
,
Filipe Camarneiro
,
Joana D. Santos
,
Pablo Valentim
,
Joao Cunha
and
Patrícia C. Sousa
INL—International Iberian Nanotechnology Laboratory, 4715-330 Braga, Portugal
*
Author to whom correspondence should be addressed.
Photonics 2024, 11(12), 1200; https://doi.org/10.3390/photonics11121200 (registering DOI)
Submission received: 29 November 2024 / Revised: 11 December 2024 / Accepted: 18 December 2024 / Published: 20 December 2024
(This article belongs to the Special Issue Recent Advances in Diffractive Optics)
Review Reports Versions Notes

Abstract

Arbitrarily designed flat optics directly manipulate the light wavefront to reproduce complex optical functions, enabling more compact optical assemblies and microsystem integration. Phase-shifting micro-optical devices rely on locally tailoring the optical path length of the wavefront through binary or multilevel surface relief micro- and nanostructures. Considering the resolution and tolerances of the production processes and the optical properties of the substrate and coating materials is crucial for designing robust multilevel diffractive flat optics. In this work, we evaluate the impact of the grayscale laser lithography resolution and geometry constraints on the efficiency of surface-relief diffractive lenses, and we analyze the process parameter space that limit lens performance. We introduce a spectral bandwidth metric to help evaluate the broad-spectrum performance of different materials. We simulate and experimentally observe that the diffractive focusing is dominated by the periodic wavelength-dependent phase discontinuities arising in the profile transitions of multilevel diffractive lenses.
Keywords: diffractive optics; diffraction efficiency; grayscale lithography; flat optics; optimization diffractive optics; diffraction efficiency; grayscale lithography; flat optics; optimization

Share and Cite

MDPI and ACS Style

Aguiam, D.E.; Dias, A.; Rodrigues, M.J.L.F.; Shanker, A.; Camarneiro, F.; Santos, J.D.; Valentim, P.; Cunha, J.; Sousa, P.C. Considering Grayscale Process and Material Properties for Robust Multilevel Diffractive Flat Optics. Photonics 2024, 11, 1200. https://doi.org/10.3390/photonics11121200

AMA Style

Aguiam DE, Dias A, Rodrigues MJLF, Shanker A, Camarneiro F, Santos JD, Valentim P, Cunha J, Sousa PC. Considering Grayscale Process and Material Properties for Robust Multilevel Diffractive Flat Optics. Photonics. 2024; 11(12):1200. https://doi.org/10.3390/photonics11121200

Chicago/Turabian Style

Aguiam, Diogo E., Ana Dias, Manuel J. L. F. Rodrigues, Aamod Shanker, Filipe Camarneiro, Joana D. Santos, Pablo Valentim, Joao Cunha, and Patrícia C. Sousa. 2024. "Considering Grayscale Process and Material Properties for Robust Multilevel Diffractive Flat Optics" Photonics 11, no. 12: 1200. https://doi.org/10.3390/photonics11121200

APA Style

Aguiam, D. E., Dias, A., Rodrigues, M. J. L. F., Shanker, A., Camarneiro, F., Santos, J. D., Valentim, P., Cunha, J., & Sousa, P. C. (2024). Considering Grayscale Process and Material Properties for Robust Multilevel Diffractive Flat Optics. Photonics, 11(12), 1200. https://doi.org/10.3390/photonics11121200

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