Prediction through Simulation-Based Corrective Models of Contra-Directional Couplers’ Experimental Results

Venâncio, Inês; Tátá, Joana; Carvalhais, Maria João; Santos, João; Teixeira, António

doi:10.3390/photonics11080774

Open AccessArticle

Prediction through Simulation-Based Corrective Models of Contra-Directional Couplers’ Experimental Results

by

Inês Venâncio

^1,2,3,*,

Joana Tátá

^2,*,

Maria João Carvalhais

¹,

João Santos

^2,4

and

António Teixeira

^1,2

¹

Instituto de Telecomunicações, 3810-193 Aveiro, Portugal

²

PICadvanced, S.A., 3830-352 Ílhavo, Portugal

³

Department of Physics, University of Aveiro, 3810-193 Aveiro, Portugal

⁴

Department of Electronics, Telecommunications and Informatics, University of Aveiro, 3810-193 Aveiro, Portugal

^*

Authors to whom correspondence should be addressed.

Photonics 2024, 11(8), 774; https://doi.org/10.3390/photonics11080774

Submission received: 8 July 2024 / Revised: 8 August 2024 / Accepted: 9 August 2024 / Published: 20 August 2024

(This article belongs to the Special Issue Integrated Waveguide-Based Photonic Devices)

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Abstract

Lithography variation presents one of the biggest challenges for photonic component optimization, especially for fabless designers. Lithography prediction models are a crucial tool for minimizing the necessary number of fabrication iterations for a device’s optimization. This paper presents one of these models specifically adapted for the contra-directional coupler structure. Through the experimental characterization of devices with a specific range of design parameters, it was possible to observe how the lithography process impacts their performance. A correction model based on effective refractive index variation and its impact on the Bragg condition of the structure was developed to predict the performance variation of a device based on the expected design variation induced by fabrication. The contra-directional couplers fabricated at CORNERSTONE foundry show a tendency to be redshifted as the gap decreases, due to an increase in waveguide width as a result of a diffraction-limited lithography process. Based on these and other findings, it was possible to correlate the design parameters to the posterior fabricated structure and ultimately predict the expected experimental response.

Keywords: fabrication process variation; contra directional couplers; lithography correction models; silicon photonics

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MDPI and ACS Style

Venâncio, I.; Tátá, J.; Carvalhais, M.J.; Santos, J.; Teixeira, A. Prediction through Simulation-Based Corrective Models of Contra-Directional Couplers’ Experimental Results. Photonics 2024, 11, 774. https://doi.org/10.3390/photonics11080774

AMA Style

Venâncio I, Tátá J, Carvalhais MJ, Santos J, Teixeira A. Prediction through Simulation-Based Corrective Models of Contra-Directional Couplers’ Experimental Results. Photonics. 2024; 11(8):774. https://doi.org/10.3390/photonics11080774

Chicago/Turabian Style

Venâncio, Inês, Joana Tátá, Maria João Carvalhais, João Santos, and António Teixeira. 2024. "Prediction through Simulation-Based Corrective Models of Contra-Directional Couplers’ Experimental Results" Photonics 11, no. 8: 774. https://doi.org/10.3390/photonics11080774

APA Style

Venâncio, I., Tátá, J., Carvalhais, M. J., Santos, J., & Teixeira, A. (2024). Prediction through Simulation-Based Corrective Models of Contra-Directional Couplers’ Experimental Results. Photonics, 11(8), 774. https://doi.org/10.3390/photonics11080774

Note that from the first issue of 2016, this journal uses article numbers instead of page numbers. See further details here.

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Prediction through Simulation-Based Corrective Models of Contra-Directional Couplers’ Experimental Results

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