Grating Coupler Design for Low-Cost Fabrication in Amorphous Silicon Photonic Integrated Circuits
Abstract
:1. Introduction
2. Brief Review of Light-Coupling Methods
- Lensed fibers [43];
Grating Couplers
3. Materials and Methods
3.1. Single-Mode Optical Fiber
3.2. Single-Mode Waveguide
3.3. Grating Coupler Design
3.4. Grating-Coupler Optimization
3.5. Linear Refractive-Index Variation
3.6. Quadratic Refractive-Index Variation
3.7. Fill Factor Greater than 50%
3.8. Overlapped-Grating Design
3.9. Random-Distribution Overlapped Grating Design
4. Results
4.1. Fundamental Mode of the Waveguide
4.2. Simulated Single-Mode-Fiber Fundamental Mode
4.3. Non-Optimized Grating-Coupler Performance
4.4. Constant Refractive Index and Fill Factor Greater than 50%
4.5. Linear Effective-Refractive-Index Variation
4.6. Quadratic Effective-Refractive-Index Variation
4.7. Overlapped Micrometric Design
4.8. Random Distribution
5. Discussion
6. Conclusions
7. Future Work and Improvement
Author Contributions
Funding
Institutional Review Board Statement
Informed Consent Statement
Data Availability Statement
Conflicts of Interest
Appendix A
gratingLength = 20;//micrometer delta_neff = −0.3;//1/micrometer delta_z = 10.4;//micrometer (SMF-28 MFD) m = delta_neff/delta_z; neff0 = 2.65348;//F = 0.9 theta = deg2rad(15);//15 deg ne = 1;//air nu = 2.8372;//220 nm aSiH strip waveguide (2D-FEM) lambda0 = 1.55;//micrometer z = 0; neff = 0; GP = 0; F = 0; num = 1; while (z < gratingLength){ neff = m*z + neff0; GP = lambda0/(neff − sin(theta));//GP = Grating period (micrometer) F = (neff − ne)/(nu − ne); print(“GP”+num2str(num)+” = “+num2str(GP,3)+“\r\n”);//round to nm print(“F”+num2str(num)+” = “+num2str(F,3) + “\r\n”);//round to nm z = z + GP; num = num + 1; }
Appendix B
a = 0.001; b = −0.039; gratingLength = 20;//micrometer neff0 = 2.65348;//F = 0.9 theta = deg2rad(15);//15 deg ne = 1;//air nu = 2.8372;//220 nm aSiH strip waveguide (2D-FEM) lambda0 = 1.55;//micrometer z = 0; neff = 0; GP = 0; F = 0; num = 1; while (z < gratingLength){ neff = a*z^2 + b*z + neff0; GP = lambda0/(neff - sin(theta));//GP = Grating period (micrometer) F = (neff - ne)/(nu - ne); print([“GP”+num2str(num)+” = “+num2str(GP,3)+“\r\n”]);//round to nm print([“F”+num2str(num)+” = “+num2str(F,3)+“\r\n”]);//round to nm z = z + GP; num = num + 1; }
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Parameter | Value |
---|---|
Attenuation | ≤0.22 dB/km |
Mode Field Diameter (MFD) | 10.4 ± 0.8 µm |
Core Diameter | 8.2 µm |
Cladding Diameter | 125 ± 0.7 µm |
Coating Diameter | 245 ± 5 µm |
Effective Refractive Index (Neff at rated MFD) | 1.4682 |
Refractive Index Difference | 0.36% |
Segment Number | Λ [nm] | F (LE/Λ) | Segment Number | Λ [nm] | F (LE/Λ) |
---|---|---|---|---|---|
1 | 647 | 0.900 | 15 | 732 | 0.750 |
2 | 652 | 0.890 | 16 | 739 | 0.738 |
3 | 658 | 0.880 | 17 | 747 | 0.727 |
4 | 663 | 0.869 | 18 | 754 | 0.715 |
5 | 668 | 0.859 | 19 | 763 | 0.703 |
6 | 674 | 0.848 | 20 | 771 | 0.691 |
7 | 680 | 0.838 | 21 | 779 | 0.679 |
8 | 686 | 0.827 | 22 | 788 | 0.667 |
9 | 692 | 0.816 | 23 | 798 | 0.654 |
10 | 698 | 0.805 | 24 | 807 | 0.642 |
11 | 704 | 0.795 | 25 | 817 | 0.629 |
12 | 711 | 0.783 | 26 | 827 | 0.616 |
13 | 718 | 0.772 | 27 | 838 | 0.603 |
14 | 725 | 0.761 | 28 | 849 | 0.590 |
Segment Number | Λ [nm] | F (LE/Λ) | Segment Number | Λ [nm] | F (LE/Λ) |
---|---|---|---|---|---|
1 | 647 | 0.900 | 15 | 734 | 0.746 |
2 | 654 | 0.886 | 16 | 739 | 0.738 |
3 | 661 | 0.873 | 17 | 744 | 0.731 |
4 | 668 | 0.860 | 18 | 748 | 0.725 |
5 | 674 | 0.848 | 19 | 752 | 0.719 |
6 | 681 | 0.836 | 20 | 755 | 0.713 |
7 | 687 | 0.824 | 21 | 759 | 0.709 |
8 | 694 | 0.813 | 22 | 761 | 0.705 |
9 | 700 | 0.802 | 23 | 764 | 0.701 |
10 | 706 | 0.791 | 24 | 766 | 0.698 |
11 | 712 | 0.781 | 25 | 767 | 0.696 |
12 | 718 | 0.772 | 26 | 769 | 0.694 |
13 | 724 | 0.763 | 27 | 769 | 0.693 |
14 | 729 | 0.754 | 28 | 769 | 0.693 |
GC Design | GC Material | GC Feature Size * | Coupling Efficiency | −1 dB Bandwidth | Bottom Reflector | Required Masks ** | Reference |
---|---|---|---|---|---|---|---|
Silicon Nitride Top Layer | Si | 266 nm | −1.7 dB | 64 nm | No | 3 | [67] |
Fully Etched Apodized | Si | 100 nm | −0.6 dB | (71 nm, −3 dB) | Yes, Al layer | 1 | [57] |
Shift-pattern Overlay | Si/Poly-Si | 171 nm | −0.9 dB | 35 nm | No | 3 | [39] |
Dual-level GC | Si | 60 nm | −0.8 dB | 31.3 nm | No | 3 | [40] |
Bilayer GC | Si3N4 | N/A | −1.0 dB | 117 nm | Yes, DBR | 2 | [60] |
Dual-level GC | Si3N4/Si | 200 nm | −1.3 dB | 80 nm | Yes, GC | 2 | [52] |
Chirped GC | Si | 26 nm | −0.1 dB | (35 nm, −3 dB) | Yes, DBR | 2 | [54] |
Multilayer Bottom Reflector | SiNx | 86 nm | −1.8 dB | 52.5 nm | Yes, DBR | 1 | [53] |
Bilayer GC | SiNx | N/A | −2.7 dB | 47.9 nm | No | 2 | [42] |
Compact Focusing GC | Si | 315 nm | −7.0 dB *** | 41 nm | No | 2 | [66] |
Uniform GC | Si | 270 nm | −5.8 dB | (48.5 nm, −3 dB) | No | 2 | [65] |
Segmented GC | Si | 190 nm | −2.9 dB | (71.4 nm, −3 dB) | No | 2 | [65] |
Non-optimized GC | a-Si:H | 510 nm | −9.7 dB | N/A | No | 1 | This work |
Fill factor > 50% | a-Si:H | 120 nm | −4.3 dB | 25 nm | No | 1 | This work |
Linear R.I. Variation | a-Si:H | 60 nm | −3.1 dB | 26 nm | No | 1 | This work |
Quadratic R.I. Variation | a-Si:H | 60 nm | −2.8 dB | 25 nm | No | 1 | This work |
Overlapped Micrometric | a-Si:H | 750 nm | −7.5 dB | 22 nm | No | 2 | This work |
Random Distribution | a-Si:H | 650 nm | −12.8 dB | N/A | No | 2 | This work |
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Almeida, D.; Lourenço, P.; Fantoni, A.; Costa, J.; Vieira, M. Grating Coupler Design for Low-Cost Fabrication in Amorphous Silicon Photonic Integrated Circuits. Photonics 2024, 11, 783. https://doi.org/10.3390/photonics11090783
Almeida D, Lourenço P, Fantoni A, Costa J, Vieira M. Grating Coupler Design for Low-Cost Fabrication in Amorphous Silicon Photonic Integrated Circuits. Photonics. 2024; 11(9):783. https://doi.org/10.3390/photonics11090783
Chicago/Turabian StyleAlmeida, Daniel, Paulo Lourenço, Alessandro Fantoni, João Costa, and Manuela Vieira. 2024. "Grating Coupler Design for Low-Cost Fabrication in Amorphous Silicon Photonic Integrated Circuits" Photonics 11, no. 9: 783. https://doi.org/10.3390/photonics11090783