Matsunami, N.; Sataka, M.; Okayasu, S.; Tsuchiya, B.
Modification of SiO2, ZnO, Fe2O3 and TiN Films by Electronic Excitation under High Energy Ion Impact. Quantum Beam Sci. 2021, 5, 30.
https://doi.org/10.3390/qubs5040030
AMA Style
Matsunami N, Sataka M, Okayasu S, Tsuchiya B.
Modification of SiO2, ZnO, Fe2O3 and TiN Films by Electronic Excitation under High Energy Ion Impact. Quantum Beam Science. 2021; 5(4):30.
https://doi.org/10.3390/qubs5040030
Chicago/Turabian Style
Matsunami, Noriaki, Masao Sataka, Satoru Okayasu, and Bun Tsuchiya.
2021. "Modification of SiO2, ZnO, Fe2O3 and TiN Films by Electronic Excitation under High Energy Ion Impact" Quantum Beam Science 5, no. 4: 30.
https://doi.org/10.3390/qubs5040030
APA Style
Matsunami, N., Sataka, M., Okayasu, S., & Tsuchiya, B.
(2021). Modification of SiO2, ZnO, Fe2O3 and TiN Films by Electronic Excitation under High Energy Ion Impact. Quantum Beam Science, 5(4), 30.
https://doi.org/10.3390/qubs5040030