A Compact Robust OWLS System for Biosensing of Multiple Samples †
Abstract
:1. Introduction
2. Device Concepts
3. Materials and Methods.
3.1. Device Design and Fabrication Process
- Deposition of 65 nm of Si3N4 on a fused silica (SiO2) wafer by Low Pressure Chemical Vapor Deposition (LPCVD), at 770 °C, for 18 min.
- Grating patterning: a 0.5 µm pitch, 50% duty cycle grating was etched by Electron-Beam Lithography on a photoresist coating. After developing it the wafer was etched by Reactive Ion Etching at an Oxford Plasmalab 100 RIE facility for two minutes to obtain a grating depth of 20 nm (Figure 1a).
- Plasma-Enhanced Chemical Vapor Deposition (PECVD) of a 510 nm SiO2 passivation layer, at 710 °C for 60 min, covering the full wafer.
- Photolithographic definition and HF etching of the SiO2 passivation layer, opening the sensing windows (blue areas on Figure 1b). The central grating remained passivated to act as reference channel.
3.2. Holder Design and Fluidics
3.3. Instrumentation
4. Results
5. Conclusions
Author Contributions
Acknowledgments
References
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Moreno-Sereno, M.; Darwish-Miranda, N.; Giménez-Conejo, M.; Palacio-Bonet, F.; Bernat-Ubiaga, I.; Romano-Rodríguez, A. A Compact Robust OWLS System for Biosensing of Multiple Samples. Proceedings 2018, 2, 863. https://doi.org/10.3390/proceedings2130863
Moreno-Sereno M, Darwish-Miranda N, Giménez-Conejo M, Palacio-Bonet F, Bernat-Ubiaga I, Romano-Rodríguez A. A Compact Robust OWLS System for Biosensing of Multiple Samples. Proceedings. 2018; 2(13):863. https://doi.org/10.3390/proceedings2130863
Chicago/Turabian StyleMoreno-Sereno, Mauricio, Nasser Darwish-Miranda, Miquel Giménez-Conejo, Francisco Palacio-Bonet, Iván Bernat-Ubiaga, and Albert Romano-Rodríguez. 2018. "A Compact Robust OWLS System for Biosensing of Multiple Samples" Proceedings 2, no. 13: 863. https://doi.org/10.3390/proceedings2130863