Lin, C.-Y.; Chen, C.-W.; Wang, J.-H.; Wang, C.-Y.; Wang, W.-L.; Tu, H.-K.
Application of Machine Learning for Optimizing Chemical Vapor Deposition Quality. Eng. Proc. 2025, 108, 5.
https://doi.org/10.3390/engproc2025108005
AMA Style
Lin C-Y, Chen C-W, Wang J-H, Wang C-Y, Wang W-L, Tu H-K.
Application of Machine Learning for Optimizing Chemical Vapor Deposition Quality. Engineering Proceedings. 2025; 108(1):5.
https://doi.org/10.3390/engproc2025108005
Chicago/Turabian Style
Lin, Chen-Yu, Chun-Wei Chen, Jung-Hsing Wang, Chung-Ying Wang, Wei-Lin Wang, and Hao-Kai Tu.
2025. "Application of Machine Learning for Optimizing Chemical Vapor Deposition Quality" Engineering Proceedings 108, no. 1: 5.
https://doi.org/10.3390/engproc2025108005
APA Style
Lin, C.-Y., Chen, C.-W., Wang, J.-H., Wang, C.-Y., Wang, W.-L., & Tu, H.-K.
(2025). Application of Machine Learning for Optimizing Chemical Vapor Deposition Quality. Engineering Proceedings, 108(1), 5.
https://doi.org/10.3390/engproc2025108005