Shendokar, S.; Hossen, M.F.; Nalawade, S.; Mantripragada, S.; Aravamudhan, S.
Predictive Evaluation of Atomic Layer Deposition Characteristics for Synthesis of Al2O3 thin Films. Eng. Proc. 2023, 37, 90.
https://doi.org/10.3390/ECP2023-14631
AMA Style
Shendokar S, Hossen MF, Nalawade S, Mantripragada S, Aravamudhan S.
Predictive Evaluation of Atomic Layer Deposition Characteristics for Synthesis of Al2O3 thin Films. Engineering Proceedings. 2023; 37(1):90.
https://doi.org/10.3390/ECP2023-14631
Chicago/Turabian Style
Shendokar, Sachin, Moha Feroz Hossen, Swapnil Nalawade, Shobha Mantripragada, and Shyam Aravamudhan.
2023. "Predictive Evaluation of Atomic Layer Deposition Characteristics for Synthesis of Al2O3 thin Films" Engineering Proceedings 37, no. 1: 90.
https://doi.org/10.3390/ECP2023-14631
APA Style
Shendokar, S., Hossen, M. F., Nalawade, S., Mantripragada, S., & Aravamudhan, S.
(2023). Predictive Evaluation of Atomic Layer Deposition Characteristics for Synthesis of Al2O3 thin Films. Engineering Proceedings, 37(1), 90.
https://doi.org/10.3390/ECP2023-14631