Recent Developments in Chemical and Physical Vapor Deposition
A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Surface Characterization, Deposition and Modification".
Deadline for manuscript submissions: 31 July 2025 | Viewed by 463
Special Issue Editors
Interests: surface engineering; vacuum technologies; tool materials; tribology; coating adhesion
Special Issues, Collections and Topics in MDPI journals
Special Issue Information
Dear Colleagues,
As the demands on various machine parts, equipment components or tools continue to increase, it becomes necessary to enhance their durability and reliability. In order to meet these requirements, new materials are being developed, and modifications are being made to the properties of the materials previously used in such a capacity materials through plastic, heat or thermo-chemical processing. There have also been significant advances in surface engineering through the development of coating manufacturing technologies using chemical vapour deposition (CVD) and physical vapour deposition (PVD) methods.
In PVD methods, the material from which coatings are formed is usually either thermally evaporated or sputtered via ion bombardment. The most commonly used PVD techniques for coating deposition are cathodic arc and magnetron sputtering. For information in this topic area, we recommend works published in the Special Issue: "Coatings Deposited by Cathodic Arc and Magnetron Sputtering Process" https://www.mdpi.com/journal/coatings/special_issues/cathodic_arc_magnetron.
In CVD methods, the substrate to be coated is usually exposed to one or more volatile precursors. As a result of chemical reactions or their decomposition, these are deposited as a coating onto the surface of the substrate. Volatile by-products are also often produced and removed by flowing gas through the reaction chamber. CVD methods are often performed at reduced pressure or additionally assisted using plasma.
The use of PVD and CVD techniques allows the production of single-layer or single-phase, multi-component coatings with a multi-layer, gradient or nanostructured structure. Coatings produced using CVD and PVD techniques are widely used, among others, in optical and electronic systems, to increase wear and corrosion resistance, as thermal barriers, decorative coatings, etc.
This scope of this Special Issue will serve as a forum for papers on the following concepts:
- comparison of different CVD and PVD techniques;
- explanation and modeling of the physics of plasma formation;
- new solutions and device designs;
- methods and techniques for testing the chemical and phase composition as well as the structure and properties of coatings;
- new/innovative applications of coatings produced using CVD and PVD techniques.
We look forward to your contribution.
Dr. Mieczysław Pancielejko
Dr. Ewa Dobruchowska
Guest Editors
Manuscript Submission Information
Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.
Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.
Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
Keywords
- physical vapour deposition—PVD
- chemical vapour deposition—CVD
- surface engineering
- coating properties
- coating applications
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