Advances in Focused Ion Beam Technology for Micro- and Nano-Fabrication

A special issue of Micromachines (ISSN 2072-666X). This special issue belongs to the section "E:Engineering and Technology".

Deadline for manuscript submissions: 31 March 2025 | Viewed by 104

Special Issue Editors


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Guest Editor
State Key Laboratory for Advanced Metals and Materials, University of Science and Technology Beijing, Beijing 100083, China
Interests: ion beams; micro- and nano-fabrication; in situ characterization techniques

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Guest Editor
State Key Laboratory of Precision Measuring Technology & Instruments, Laboratory of Micro/Nano Manufacturing Technology, Tianjin University, Tianjin 300072, China
Interests: defect engineering in Wide Band Gap (WBG) semiconductor; micro/nano-fabrication using Focused Ion Beam (FIB); nano-fabrication mechanism

Special Issue Information

Dear Colleagues, 

Focus ion beam (FIB) technology has been proved to be feasible since the 1970s, and it was initially widely used in the semiconductor industry, such as for mask repair and integrated circuit design and defect analysis, etc.  With the development of material sciences and advanced in-situ characterization, FIB has been actively used in the micro- and nano-processing of materials and in-situ characterization, and it has become a research hotspot. It is used together with scanning electron microscopy (SEM), energy spectrum (EDS), and electron backscatter diffraction, which is the most important method for the analysis of materials. In this field, the electron backscatter diffraction spectrum (EBSD), energy spectrum (EDS), and electron backscatter diffraction spectrum (EBSD) are employed to achieve nanometer-scale three-dimensional in-situ characterization of material morphology, elemental, and crystal structures. Moreover, transmission electron microscopy (TEM) is utilized to achieve nanometer-scale in-situ characterization of material microstructures. The in-situ characterization of the microstructures of materials at a nanometer/atomic scale is achieved in combination with transmission electron microscopy (TEM). Furthermore, the in-situ characterization of the three-dimensional structures and compositions of materials at a nanometer/atomic scale is carried out in conjunction with three-dimensional atom probe tomography (APT).

In this Special Issue, titled “Advances in Focused Ion Beam Technology for Micro- and Nano-Fabrication”, we welcome contributions of researchers and scholars engaged in the research of focused ion beams (including multiple-ion-source focused ion beam systems, multistage-linked focused ion beam systems, etc.) regarding advanced micro- and nano-fabrication.

Prof. Yi Qiao
Prof. Dr. Zongwei Xu
Guest Editors

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Keywords

  • FIB
  • micro-fabrication
  • nano-fabrication
  • TEM
  • APT

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