Thin Films and Coatings for Electrochemical Applications

Dear Colleagues,

Thin films have been employed in many applications to provide surfaces that possess specific optical, electronic, electrochemical, chemical, mechanical, and thermal properties. The aim of this Special Issue is to present the latest research and development of electrochemical processes and devices that integrate thin film technologies, such as physical vapour deposition (PVD), chemical vapour deposition (CVD), and chemical solution deposition. This Special Issue is expected to contain a combination of original research papers and review articles from leading scientists and engineers around the world.

In particular, the topics of interest include, but are not limited to, the following:

• Overview of the fundamentals and new concepts in the design of thin films and structures for electrochemical processes and devices;
• Recent advances in the applications of various thin film deposition technologies (e.g., evaporation, sputtering, ion beam-assisted deposition (IBD), chemical vapour deposition (CVD), low-pressure chemical vapour deposition (LPCVD), plasma-enhanced chemical vapour deposition (PECVD), atomic layer deposition (ALD), pulsed laser deposition (PLD), sol–gel, electrodeposition) for electrochemical processes and devices;
• Applications of thin film technologies for electrochemical processes such as electroplating, electrolysis, plasma electrolytic oxidation, and electropolishing;
• Thin film batteries, capacitors, and supercapacitors;
• Thin film electrochemical sensors;
• Photoelectrochemical reduction of carbon dioxide;
• Applications of thin films for hydrogen energy technologies including photoelectrochemical hydrogen production, hydrogen storage, and fuel cells;
• Thin film solid electrolyte;
• Thin film coatings for improved electrical conductivity, optical reflection, corrosion resistance, hardness, abrasion resistance, and wear resistance for electrochemical processes and device components such as electrodes, current collectors, separators, and bus bars.

Dr. Dongfang Yang
Guest Editor

Manuscript Submission Information

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Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Nanomaterials is an international peer-reviewed open access semimonthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2900 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

• thin film
• evaporation
• sputtering
• ion beam-assisted deposition (IBD)
• chemical vapour deposition (CVD)
• plasma-enhanced chemical vapour deposition (PECVD)
• atomic layer deposition (ALD)
• cathodic arc deposition
• pulsed laser deposition (PLD)
• sol–gel
• electrodeposition
• energy storage
• thin film battery
• hydrogen energy production
• fuel cells
• electroplating
• electrolysis
• plasma electrolytic oxidation
• electropolishing
• photoelectrochemical reduction