Open AccessArticle
Coherent XUV Multispectral Diffraction Imaging in the Microscale
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Stylianos Petrakis, Alexandros Skoulakis, Yannis Orphanos, Anastasios Grigoriadis, Georgia Andrianaki, Dimitrios Louloudakis, Nathanail Kortsalioudakis, Athanasios Tsapras, Costas Balas, Dimitrios Zouridis, Efthymios Pachos, Makis Bakarezos, Vasilios Dimitriou, Michael Tatarakis, Emmanouil P. Benis and Nektarios A. Papadogiannis
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Abstract
The rapid growth of nanotechnology has increased the need for fast nanoscale imaging. X-ray free electron laser (XFEL) facilities currently provide such coherent sources of directional and high-brilliance X-ray radiation. These facilities require large financial investments for development, maintenance, and manpower, and thus,
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The rapid growth of nanotechnology has increased the need for fast nanoscale imaging. X-ray free electron laser (XFEL) facilities currently provide such coherent sources of directional and high-brilliance X-ray radiation. These facilities require large financial investments for development, maintenance, and manpower, and thus, only a few exist worldwide. In this article, we present an automated table-top system for XUV coherent diffraction imaging supporting the capabilities for multispectral microscopy at high repetition rates, based on laser high harmonic generation from gases. This prototype system aims towards the development of an industrial table-top system of ultrafast soft X-ray multi-spectral microscopy imaging for nanostructured materials with enormous potential and a broad range of applications in current nanotechnologies. The coherent XUV radiation is generated in a semi-infinite gas cell via the high harmonic generation of the near-infrared femtosecond laser pulses. The XUV spectral selection is performed by specially designed multilayer XUV mirrors that do not affect the XUV phase front and pulse duration.
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