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Search Results (4)

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Keywords = inverse lithography technology

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18 pages, 2780 KiB  
Article
Frequency-Decoupled Dual-Stage Inverse Lithography Optimization via Hierarchical Sampling and Morphological Enhancement
by Jie Zhou, Qingyan Zhang, Haifeng Sun, Chuan Jin, Ji Zhou and Junbo Liu
Micromachines 2025, 16(5), 515; https://doi.org/10.3390/mi16050515 - 27 Apr 2025
Viewed by 254
Abstract
Inverse lithography technology (ILT) plays a pivotal role in advanced semiconductor manufacturing because it enables pixel-level mask modifications, significantly enhances pattern fidelity, and expands process windows. However, traditional gradient-based ILT methods often struggle with the trade-off between imaging fidelity and mask manufacturability due [...] Read more.
Inverse lithography technology (ILT) plays a pivotal role in advanced semiconductor manufacturing because it enables pixel-level mask modifications, significantly enhances pattern fidelity, and expands process windows. However, traditional gradient-based ILT methods often struggle with the trade-off between imaging fidelity and mask manufacturability due to coupled optimization objectives. We propose a frequency-separated dual-stage optimization framework (FD-ILT) that strategically decouples these conflicting objectives by exploiting the inherent low-pass characteristics of lithographic systems. The first stage optimizes low-frequency (LF) components using hierarchical downsampling to generate a high-fidelity continuous transmission mask. This approach reduces computational complexity while refining resolution progressively. The second stage enforces manufacturability by exclusively adjusting high-frequency (HF) features through morphological regularization and progressive binarization penalties while maintaining the mask LF to preserve imaging accuracy. Our method achieves simultaneous control of both aspects by eliminating gradient conflicts between fidelity and manufacturing constraints. The simulation results demonstrate that FD-ILT achieves superior imaging quality and manufacturability compared to conventional gradient-based ILT methods, offering a scalable solution for advanced semiconductor nodes. Full article
(This article belongs to the Special Issue Recent Advances in Lithography)
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23 pages, 7874 KiB  
Review
Polymeric Materials and Microfabrication Techniques for Liquid Filtration Membranes
by Thomas Kerr-Phillips, Benjamin Schon and David Barker
Polymers 2022, 14(19), 4059; https://doi.org/10.3390/polym14194059 - 27 Sep 2022
Cited by 7 | Viewed by 3311
Abstract
This review surveys and summarizes the materials and methods used to make liquid filtration membranes. Examples of each method including phase inversion, electrospinning, interfacial polymerization, thin film composites, stretching, lithography and templating techniques, are given and the pros and cons of each method [...] Read more.
This review surveys and summarizes the materials and methods used to make liquid filtration membranes. Examples of each method including phase inversion, electrospinning, interfacial polymerization, thin film composites, stretching, lithography and templating techniques, are given and the pros and cons of each method are discussed. Trends of recent literature are also discussed and their potential direction is deliberated. Furthermore, the polymeric materials used in the fabrication process of liquid filtration membranes are also reviewed and trends and similarities are shown and discussed. Thin film composites and selective filtration applications appear to be a growing area of research for membrane technology. Other than the required mechanical properties (tensile strength, toughness and chemical and thermal stability), it becomes apparent that polymer solubility and hydropathy are key factors in determining their applicability for use as a membrane material. Full article
(This article belongs to the Special Issue Advanced Polymeric Materials for Membrane Technology II)
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10 pages, 1407 KiB  
Article
High Refractive Index Inverse Vulcanized Polymers for Organic Photonic Crystals
by Christian Tavella, Paola Lova, Martina Marsotto, Giorgio Luciano, Maddalena Patrini, Paola Stagnaro and Davide Comoretto
Crystals 2020, 10(3), 154; https://doi.org/10.3390/cryst10030154 - 28 Feb 2020
Cited by 18 | Viewed by 5072
Abstract
Photonic technologies are nowadays dominated by highly performing inorganic structures that are commonly fabricated via lithography or epitaxial growths. Unfortunately, the fabrication of these systems is costly, time consuming, and does not allow for the growth of large photonic structures. All-polymer photonic crystals [...] Read more.
Photonic technologies are nowadays dominated by highly performing inorganic structures that are commonly fabricated via lithography or epitaxial growths. Unfortunately, the fabrication of these systems is costly, time consuming, and does not allow for the growth of large photonic structures. All-polymer photonic crystals could overcome this limitation thanks to easy solubility and melt processing. On the other hand, macromolecules often do not offer a dielectric contrast large enough to approach the performances of their inorganic counterparts. In this work, we demonstrate a new approach to achieve high dielectric contrast distributed Bragg reflectors with a photonic band gap that is tunable in a very broad spectral region. A highly transparent medium was developed through a blend of a commercial polymer with a high refractive index inverse vulcanized polymer that is rich in sulfur, where the large polarizability of the S–S bond provides refractive index values that are unconceivable with common non-conjugated polymers. This approach paves the way to the recycling of sulfur byproducts for new high added-value nano-structures. Full article
(This article belongs to the Special Issue Sonic and Photonic Crystals)
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16 pages, 2730 KiB  
Article
Multi-Objective Defocus Robust Source and Mask Optimization Using Sensitive Penalty
by Pengzhi Wei, Yanqiu Li, Tie Li, Naiyuan Sheng, Enze Li and Yiyu Sun
Appl. Sci. 2019, 9(10), 2151; https://doi.org/10.3390/app9102151 - 27 May 2019
Cited by 8 | Viewed by 2977
Abstract
The continuous decrease in the size of lithographic technology nodes has led to the development of source and mask optimization (SMO) and also to the control of defocus becoming stringent in the actual lithography process. Due to multi-factor impact, defocusing is always changeable [...] Read more.
The continuous decrease in the size of lithographic technology nodes has led to the development of source and mask optimization (SMO) and also to the control of defocus becoming stringent in the actual lithography process. Due to multi-factor impact, defocusing is always changeable and uncertain in the real exposure process. But conventional SMO assumes the lithography system is ideal, which only compensates the optical proximity effect (OPE) in the best focus plane. Therefore, to solve the inverse lithography problem with more uniformity of pattern in different defocus variations, we proposed a defocus robust SMO (DRSMO) approach that is driven by a defocus sensitivity penalty function for the first time. This multi-objective optimization samples a wide range of defocus disturbances and it can be proceeded by the mini-batch gradient descent (MBGD) algorithm effectively. The simulation results showed that a more robust defocus source and mask can be designed through DRSMO optimization. The defocus sensitivity factor sβ maximally decreased 63.5% compared to conventional SMO, and due to the low error sensitivity and the depth of defocus (DOF), the process window (PW) was further enlarged effectively. Compared to conventional SMO, the exposure latitude (EL) maximally increased from 4.5% to 10.5% and DOF maximally increased 54.5% (EL = 5%), which proved the validity of the DRSMO method in improving the focusing performance. Full article
(This article belongs to the Section Optics and Lasers)
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