Deprotection of Acetals and Ketals by Silica Sulfuric Acid and Wet SiO2
Abstract
:Introduction
Results and Discussion
Conclusions
Entry | Substrate | Substrate (mmole) / I (g) / II (g) | Time (min) | Yield (%) | Product |
---|---|---|---|---|---|
1a | | 0.2 / 0.12 / 0.2 | 60 | 95 | |
1b | | 0.35 / 0.1 / 0.1 | 60 | 94 | |
1c | | 0.26 / 0.25 / 0.27 | 60 | 98 | |
1d | | 0.25 / 0.2 / 0.2 | 60 | 93 | |
1e | | 0.25 / 0.2 / 0.2 | 75 | 94 | |
1f | | 0.3 / 0.11 / 0.15 | 60 | 97 | |
1g | | 0.25 / 0.3 / 0.3 | 60 | 98 | |
1h | | 0.2 / 0.3 / 0.3 | 60 | 97 | |
1i | | 0.25 / 0.3 / 0.3 | 75 | 95 | |
1j | | 0.25 / 0.4 / 0.4 | 60 | 98 | |
1k | | 0.25 / 0.3 / 0.3 | 60 | 96 | |
1l | | 0.25 / 0.3 / 0.3 | 60 | 98 | |
1m | | 0.25 / 0.3 / 0.4 | 60 | 97 | |
Acknowledgments
Experimental
General
Preparation of silica sulfuric acid
Typical procedure for deacetalization of acetals (1) to the corresponding aldehydes (2): Preparation of 4-nitrobenzaldehyde (2g).
References
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- Sample Availability: Samples of substrates 1c, 1g-1l and the 3-nitro and 4-cyano analogs of substrate 1g are available from MDPI.
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Mirjalili, B.F.; Zolfigol, M.A.; Bamoniri, A. Deprotection of Acetals and Ketals by Silica Sulfuric Acid and Wet SiO2. Molecules 2002, 7, 751-755. https://doi.org/10.3390/71000751
Mirjalili BF, Zolfigol MA, Bamoniri A. Deprotection of Acetals and Ketals by Silica Sulfuric Acid and Wet SiO2. Molecules. 2002; 7(10):751-755. https://doi.org/10.3390/71000751
Chicago/Turabian StyleMirjalili, BiBi Fathemeh, Mohamad Ali Zolfigol, and Abdolhamid Bamoniri. 2002. "Deprotection of Acetals and Ketals by Silica Sulfuric Acid and Wet SiO2" Molecules 7, no. 10: 751-755. https://doi.org/10.3390/71000751