DC Electrical Properties of Tio2 Thin Films
Recordings of the direct current (
I) flowing through the TiO
2 films over a range of applied voltages (
V) were made on several films with different thickness at room temperature and in the open atmosphere of the laboratory.
Figure 1 shows the dependence of current
I on voltage
V for TiO
2 films at different thicknesses. Each curve is characterised by two different voltage regions. At lower voltages (less than 0.6 V) the slopes of the curves are approximately unity indicates that ohmic conduction is the main conduction process, whereas at higher voltages the slopes are close to 5 indicates that space charge limited conductivity (SCLC) is responsible for the current through the TiO
2 film. The abrupt changes in the slopes of the plots are characteristic of a change in the modes of conduction in the films from Ohmic to space charge limited conductivity (SCLC) [
8]. In our previous paper [
6], we concluded that the films are p-type semiconductors so the majority carriers are holes. We have shown that oxygen plays a major part in the creation of the holes initially in the valence band of the TiO
2 by forming a thin oxide complex layer on the surface of the film.
A hole is formed in the valence band when an electron e
– is donated to the complex. At lower applied voltages, the current density is low and the current is given by:
where
S is the effective cross-sectional area of the film,
p0 is the thermally generated hole concentration in the valence band,
e is the electronic charge, μ is the hole mobility and
d is the effective film thickness.
Figure 1.
Dependence of current on voltage for TiO2 samples of thicknesses of (a) 5 μm, (b) 10 μm, (c) 15 μm, (d) 20 μm at room temperature.
Figure 1.
Dependence of current on voltage for TiO2 samples of thicknesses of (a) 5 μm, (b) 10 μm, (c) 15 μm, (d) 20 μm at room temperature.
Thus a graph of log
I against log
V has a gradient of 1. At higher applied voltages, holes are injected into the films and the current increases rapidly. Mutual repulsion between the holes contributes to the SCLC but the results below show that trap levels play a major part in this case. In p-type semiconductors, the traps are negative and extend in energy from the top of the valence band towards the Fermi level. The mean energy of the traps is k
Tt, where
Tt is a temperature parameter characterising the distribution and k is Boltzmann’s constant. The distribution of trap levels in energy
E above the valence band is given by:
where,
P(
E) is the trap density per unit energy and
P0 is the value of
P(
E) at the valence band edge. The current-voltage dependence in this case is given by [
8]:
where,
NV is the effective density of states in the valence band, ε is the permittivity, and
ℓ =
Tt/
T (
T is the temperature of the film). It follows from equation (6) that in the SCLC region,
I ∝
Vℓ+1. Taking the logarithm of equation (6):
Thus in the SCLC region, a graph of log
I against log
V will have a slope of (
ℓ +1) for a film with a particular thickness. From
Figure 1, the slopes of the line in the SCLC region ≈ 5 so that
ℓ ≈ 4. The characteristic temperature
Tt ≈ 1200 K at room temperature (
T = 300 K) and the mean trap energy k
Tt ≈ 0.1eV. The power law relationship between
I and
V in the SCLC region is
I ∝
V5. This result indicates that traps in the film are the main contributors to the SCLC region. If traps are not present then the SCLC is dominated by mutual repulsion between the charge carriers and the expected power law relationship between
I and
V is
I ∝
V2 (Child-Langmuir Law).
Figure 2.
Current-voltage characteristics of a fresh TiO2 film of thickness 5 μm exposed to (a) nitrogen, (b) 150 ppm benzene at room temperature.
Figure 2.
Current-voltage characteristics of a fresh TiO2 film of thickness 5 μm exposed to (a) nitrogen, (b) 150 ppm benzene at room temperature.
The Response of the Films to Different Concentrations of Benzene
Measurements on the response of the films to benzene were made using freshly prepared TiO
2 films. The direct current through films with a thickness of 5 μm was measured at
V = 1V as the concentration of the benzene vapour in the nitrogen carrier gas was increased and decreased in steps of 50 ppm over the range 150 ppm to 350 ppm. After each increase in concentration of the benzene, the glass sample chamber was flushed with nitrogen. In all cases, the current through the films decreased as the concentration of the benzene in the carrier gases increased (
Figure 3). The films have fast response times to increasing and decreasing concentrations of benzene (about 1 min and 5 min respectively).
Figure 3.
Variation of the current flowing through a fresh TiO2 sensor when exposed to step changes in the concentration of benzene at room temperature.
Figure 3.
Variation of the current flowing through a fresh TiO2 sensor when exposed to step changes in the concentration of benzene at room temperature.
The response of a p-type semiconductor sensor to reducing gases can be expressed in terms of the relative variation, ∆
R, of the sensor resistance to a given concentration of the vapour [
9].
where,
Rvapour is the resistance of the film when exposed to an atmosphere containing a known concentration of the vapour and
R0 is the resistance of the film when exposed just to the carrier gas. The calibration curve for a film was obtained by plotting ∆
R against the concentration of benzene vapour in the carrier gas (
Figure 4). The relative resistance of the sensor increased linearly with increasing concentrations of benzene (r = 0.92) over the range 150 to 350 ppm. The sensitivity of the films to benzene (0.042% ppm
-1) was determined from the slope of the graph. The detection limit for the benzene vapours is about 10 ppm. All films tested have a similar response to benzene but thinner films are generally more sensitive and have a more linear response. These results indicate that it should be possible to make a film suitable for the routine analysis of atmospheric concentrations of benzene (detection limit <5 ppm) simply by making the films very much thinner. However, it was not possible to make reliable films thinner than 5µm using the simple spin coating technique.
Figure 4.
Variation in relative resistance ∆R of a fresh TiO2 sensor as a function of the concentration of benzene in the carrier gas.
Figure 4.
Variation in relative resistance ∆R of a fresh TiO2 sensor as a function of the concentration of benzene in the carrier gas.
Proposed Mechanism for the Detection of Benzene
The fast response and recovery times of the films to benzene implies that the benzene vapour molecules must interact weakly and reversibly with the TiO
2 films. Thinner TiO
2 films are more sensitive to benzene than thicker ones so it is likely that the adsorbed benzene molecules have a surface, rather than a bulk effect on the conduction characteristics of the films. Just a few molecular layers below the surface of the film are probably affected by the interaction. The films are operated in the SCLC region of their characteristics where they are p-type semiconductors. The benzene molecules on the surface must interact with the holes causing the resistance of the films to increase by producing more traps in the film, or by injecting electrons into the valence band, or both. It is more likely that the interaction results in electrons being injected into the valence band, as this process is probably more rapid and readily reversible than the creation of traps. A proposed mechanism involves the production of surface donor states in the film by the benzene. The first stage of the process is the formation of a weak complex between benzene molecules and the surface of the film.
The complex then ionises and donor states are produced in the surface molecular layers of the film.
Initially, these donor states lie below the Fermi energy level so that ionisation of the donor states proceeds rapidly and electrons are released into the valence band.
As more surface donor states are ionised, the Fermi energy level shifts away from the valence band and the process slows down. Eventually, the Fermi level stops at some new energy value as a dynamic equilibrium is set up between benzene molecules diffusing out of the film to rejoin the ambient atmosphere and molecules diffusing into the film. The electrons injected into the valence band combine with holes, thus reducing the number of charge carriers and increasing the resistance of the film. Decreasing the concentration of benzene in the ambient atmosphere reverses the process and a new equilibrium is established. Consequently, the number of surface donor states created by the benzene molecules adsorbed onto the film surface decreases and the Fermi energy level moves back towards the valence band, resulting in an increase in the current through the film. The overall efficiency of the above reactions is likely to be very low accounting for the relatively poor sensitivity of the films to benzene.