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Editorial

Acknowledgement to Reviewers of JMMP in 2018

by
JMMP Editorial Office
MDPI, St. Alban-Anlage 66, 4052 Basel, Switzerland
J. Manuf. Mater. Process. 2019, 3(1), 7; https://doi.org/10.3390/jmmp3010007
Published: 15 January 2019
Rigorous peer-review is the corner-stone of high-quality academic publishing. The editorial team greatly appreciates the reviewers who contributed their knowledge and expertise to the journal’s editorial process over the past 12 months. In 2018, a total of 84 papers were published in the journal, with a median time to first decision of 14 days and a median time to publication of 37 days. The editors would like to express their sincere gratitude to the following reviewers for their cooperation and dedication in 2018:
Abouhamzeh, MortezaMcAndrew, Anthony R.
Ahmadi, KeivanMcMillan, Alison J.
Akhiani, HamedMeenashisundaram, Ganesh Kumar
AlMangour, BandarMikolajczyk, Tadeusz
Athanasiou, ChristosMircea, Nicoara
Barreiro, JoaquinMobed-Miremadi, Maryam
Barriobero-Vila, PereModler, Niels
Barton, MichaelMonzón, Mario D.
Baumeister, JoachimMoon, Young Hoon
Bedon, ChiaraMu, DeKui
Bellantone, VincenzoMurčinková, Zuzana
Benasciutti, DenisNadolny, Krzysztof
Béreaux, YvesNam, Jungsoo
Bollada, PeterNikhare, Chetan
Breidenstein, BerndNishikawa, Hiroshi
Buj, IreneObrosov, Aleksei
Bunaziv, IvanOliveira, João Pedro
Caggiano, AlessandraOrbulov, Imre
Calì, MichelePaiva, Jose Mario
Calleja, AmaiaPalardy, Genevieve
Cao, HuajunPalkowski, Heinz
Carlone, PierpaoloPark, Sun Hong
Carou, DiegoPehlken, Alexandra
Celentano, Diego J.Perez, Mauricio
Chavoshi, Saeed ZarePerveen, Asma
Chen, ZongHaiPetric, Marko
Cheng, Chung-WeiPlott, Jeff
Coleman, AnthonyPohjonen, Aarne
Corbin, StephenPolanski, Marek
De Lacalle, Luis Norberto LópezPolatidis, Efthymios
De Oliveira, Mario AndersonPolini, Wilma
Dehghanghadikolaei, AmirPopovich, V. A.
Demir, Ali GökhanPrashanth, Konda Gokuldoss
Dias, JulianaPratama, Mahardhika
Díaz-Álvarez, JoséRadonic, Vasa
Diego, R N Correa Rahman Rashid, Rizwan Abdul
Ding, WenfengRibeiro, João
Drégelyi-Kiss, ÁgotaRiemer, Oltmann
Duchosal, ArnaudRimpault, Xavier
Ducobu, FrançoisRivière-Lorphèvre, Edouard
Duty, ChadRizzi, Egidio
Ebin, BurcakRobinson, Seri C.
Ehtemam-Haghighi, ShimaRodriguez, Antonio Riveiro
Erdeniz, DincRudolf, Rebeka
Fang, GangSaboori, Abdollah
Fassi, IreneSalguero, Jorge
Feito, NorbertoSalvati, Enrico
Fromentin, GuillaumeSánchez, Antonio
Fuente, Germán F. De LaSantecchia, Eleonora
Galizia, PietroSato, Ryuta
Gallo, PasqualeScherillo, Fabio
Gardan, JulienSchleich, Benjamin
Gavrus, AdinelSetti, Dinesh
Ghidelli, MatteoShao, Chenhui
Girot, Franck AndréShi, Hongliang
Gloria, AntonioShimada, Keita
Goel, SauravShimizu, Yuki
Goh, Kheng-LimShukla, Pratik P.
Gong, HaijunSilva, M. Beatriz
Gong, PanSing, Swee Leong
Guglielmino, EugenioSmaga, Marek
Guimarães, GilmarSmith, William B.
Haddag, BadisSohn, Seok Su
Hassanin, HanySoltani, Niloofar
Hassui, AmauriSongmene, Victor
Hegab, HussienSrivastava, Anil
Hitzler, LeonhardStahl, Ullrich
Hofstätter, ThomasStephenson, David A.
Holub, MichalStonis, Malte
Hong, SeokmooStrano, Matteo
Hsiang, Hsing-IStruzikiewicz, Grzegorz
Humar, MihaSzala, Mirosław
Hung, WayneSzalay, Tibor
Ibaraki, SoichiTai, Bruce Li-Jung
Irukuvarghula, SandeepTeng, Chong
Ito, SoTian, Yingtao
James, SagilTo, Sandy
Jeffs, SpencerTomasz, Durejko
Jezierski, JanTosello, Guido
Jia, MingtuTowsyfyan, Hossein
Jiang, PingTrotta, Gianluca
Jin, XiaoliangTrzepieciński, Tomasz
Jozwik, JerzyTsay, Leu-Wen
Kapłonek, WojciechTuominen, Jari
Kawalec, MagdalenaTurenne, Sylvain
Kim, KeekyoungTwardowski, Paweł
Koohbor, BehradTzounis, Lazaros
Koutzarova, TatyanaUllah, AMM Sharif
Kovács, Norbert KrisztiánVan Hooreweder, Brecht
Kovaleva, MarinaVereshchaka, Alexey A.
Krenický, TiborWan, Min
Królczyk, GrzegorzWang, Chunjin
Kuczmaszewski, JozefWang, Lu
Kuznetsov, DenisWang, Zhenfeng
Kuznetsov, Vladimir E.Wartzack, Sandro
Kyratsis, PanagiotisWeisz-Patrault, Daniel
Lai, GavinWen, Tong
Lamberti, LucianoWong, Chee How
Lǎzǎrescu, LucianWu, S.C.
Lee, JinwooXu, Jie
Legutko, StanislawXu, Weixing
Lei, ShutingYagüe-Fabra, José Antonio
Lemu, Hirpa G.Yan, Jiwang
Li, YangYeong, Wai
Lian, JunheYu, Hailiang
Liang, SongmaoYuan, Julong
Liu, Chien-ShengŻak, Krzysztof
Liu, JingZarzar, Lauren D.
Liu, WeiZębala, Wojciech
Lo, KinhoZhang, Julie
Lombardi, MariangelaZhang, Laichang
Longstaff, Andrew PeterZhang, Lijun
Malhotra, RajivZhang, Nan
Mao, LeiZhang, Wujie
Markopoulos, Angelos P.Zhang, Xinquan
Maruda, Radosław W.Zhou, Jin
Máthis, KristiánZhou, Yefei
Matula, GrzegorzZhu, Haihong
Maurotto, AgostinoZhu, Zengwei
Mayer, René

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MDPI and ACS Style

JMMP Editorial Office. Acknowledgement to Reviewers of JMMP in 2018. J. Manuf. Mater. Process. 2019, 3, 7. https://doi.org/10.3390/jmmp3010007

AMA Style

JMMP Editorial Office. Acknowledgement to Reviewers of JMMP in 2018. Journal of Manufacturing and Materials Processing. 2019; 3(1):7. https://doi.org/10.3390/jmmp3010007

Chicago/Turabian Style

JMMP Editorial Office. 2019. "Acknowledgement to Reviewers of JMMP in 2018" Journal of Manufacturing and Materials Processing 3, no. 1: 7. https://doi.org/10.3390/jmmp3010007

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