Nachaithong, T.; Chanlek, N.; Moontragoon, P.; Thongbai, P.
The Primary Origin of Excellent Dielectric Properties of (Co, Nb) Co-Doped TiO2 Ceramics: Electron-Pinned Defect Dipoles vs. Internal Barrier Layer Capacitor Effect. Molecules 2021, 26, 3230.
https://doi.org/10.3390/molecules26113230
AMA Style
Nachaithong T, Chanlek N, Moontragoon P, Thongbai P.
The Primary Origin of Excellent Dielectric Properties of (Co, Nb) Co-Doped TiO2 Ceramics: Electron-Pinned Defect Dipoles vs. Internal Barrier Layer Capacitor Effect. Molecules. 2021; 26(11):3230.
https://doi.org/10.3390/molecules26113230
Chicago/Turabian Style
Nachaithong, Theeranuch, Narong Chanlek, Pairot Moontragoon, and Prasit Thongbai.
2021. "The Primary Origin of Excellent Dielectric Properties of (Co, Nb) Co-Doped TiO2 Ceramics: Electron-Pinned Defect Dipoles vs. Internal Barrier Layer Capacitor Effect" Molecules 26, no. 11: 3230.
https://doi.org/10.3390/molecules26113230
APA Style
Nachaithong, T., Chanlek, N., Moontragoon, P., & Thongbai, P.
(2021). The Primary Origin of Excellent Dielectric Properties of (Co, Nb) Co-Doped TiO2 Ceramics: Electron-Pinned Defect Dipoles vs. Internal Barrier Layer Capacitor Effect. Molecules, 26(11), 3230.
https://doi.org/10.3390/molecules26113230