ZT Optimization: An Application Focus
Abstract
:1. Introduction
2. Modelling Approach
3. Bismuth Telluride Based Material
4. Silicide Based Material
5. Conclusions
Supplementary Materials
Acknowledgments
Author Contributions
Conflicts of Interest
References
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Property | Used in Model | Literature Reported Values | Ref. |
---|---|---|---|
Doping level (cm−3) | 2.07 × 1019 | 1–5 × 1019 | [14] |
Band gap (eV) | 0.16 | 0.11–0.2 | [15,16] |
CB DOS effective mass (me) | 1.09 | 0.95–1.9 | [16,17] |
VB DOS effective mass (me) | 1.85 | 1.5–2.1 | [16,17] |
Electron mobility at low carrier concentration at 300 K (cm2·V−1·s−1) | 389 | 200–350 1 | [16] |
Hole mobility at low carrier concentration at 300 K (cm2·V−1·s−1) | 138 | 200–300 1 | [16] |
Lattic thermal conductivity at 300 K (Wm−1·K−1) | 0.742 | 0.9–1.6 | [15] |
Property | Value |
---|---|
Doping level | 3.7 × 1020 cm−3 |
Band gap | 0.42 eV |
CB DOS effective mass | 3.13 me |
VB DOS effective mass | 1.45 me |
Acoustic phonon scattering electron mobility at low carrier concentration at 300 K | 135 cm2·V−1·s−1 |
Alloy scattering electron mobility at low carrier concentration at 300 K | 47.3 cm2·V−1·s−1 |
Acoustic phonon scattering hole mobility at low carrier concentration at 300 K | 291 cm2·V−1·s−1 |
Alloy scattering hole mobility at low carrier concentration at 300 K | 102 cm2·V−1·s−1 |
Lattic thermal conductivity at 300 K | 2.1 W·m−1·K−1 |
Lattice thermal conductivity gradient | −0.0016 W·m−1·K−2 |
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Tuley, R.; Simpson, K. ZT Optimization: An Application Focus. Materials 2017, 10, 309. https://doi.org/10.3390/ma10030309
Tuley R, Simpson K. ZT Optimization: An Application Focus. Materials. 2017; 10(3):309. https://doi.org/10.3390/ma10030309
Chicago/Turabian StyleTuley, Richard, and Kevin Simpson. 2017. "ZT Optimization: An Application Focus" Materials 10, no. 3: 309. https://doi.org/10.3390/ma10030309
APA StyleTuley, R., & Simpson, K. (2017). ZT Optimization: An Application Focus. Materials, 10(3), 309. https://doi.org/10.3390/ma10030309