CMOS-Compatible Silicon Nanowire Field-Effect Transistor Biosensor: Technology Development toward Commercialization
Abstract
:1. Introduction
2. CMOS-Compatible Silicon Nanowire Fabrication Techniques
2.1. Vertical SiNWs
2.2. Horizontal SiNWs
3. Integration of Silicon Nanowires into Functional Devices
3.1. Forming High-Quality Electrical Contacts
3.2. Dielectric Insulation for Silicon Nanowire Device
3.3. Sample Delivery: on-Chip Microfluidics Integration
3.4. Multichannel Electronic Readouts
4. Sensing Performance: Finding the Best Compromise among SiNW FETs Fabrication Aspects
4.1. Impact of the Nanowire Design in Sensing Performance
4.2. Considerations on Fabrication Route and Process-Selection Frame Work
4.3. Molecular Probes and Target Analytes
5. Applications of Silicon Nanowire Biosensor in Biomedical and Environmental Monitoring
5.1. Medical Diagnosis Device Development
5.2. Bio-Pharmaceutical Applications
5.3. Environmental Monitoring
6. Challenges and Opportunities of Silicon Nanowire Biosensor
6.1. Early-Stage Development Platforms
6.2. Challenges and Needs for Commercialization of Silicon Nanowire Biosensor
7. Conclusions and Outlook
Author Contributions
Funding
Acknowledgments
Conflicts of Interest
References
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Step | Selection | Possible Options and Their Characteristics | |
---|---|---|---|
Option A | Option B | ||
1 | Silicon crystallization type | Monocrystalline. Mostly available on SOI wafer, expensive, best electronics properties and uniformity | Polycrystalline. Require deposition and thermal annealing. Cheap, relative good electronic properties, uniformity depend on deposition and annealing process |
2 | Nanowire designs | Low-concentration doping (<1017 cm−3) yields higher detection sensitivity | High-concentration doping (>1017 cm−3) yields lower detection sensitivity |
Smaller NWs yield higher SVR and hence more sensitivity to charge detection | Larger cross-sectional NWs result in lower SVR and lower detection sensitivity | ||
Single NW: Theoretically better LODs but prone to large detection signal variation and batch to batch variation | NW arrays: Better reliability but lower limit of detections (LODs) | ||
3 | Top-down fabrication routes | Horizontal NWs: High density, good control over quality and uniformity, compatible to packaging and integration but require advanced facility and have high fabrication cost. | Vertical silicon NWs: High aspect ratio, high density, good uniformity and low cost but challenging in regard to integration, packaging and sample delivery |
3’ | Horizontal SiNW fabrication approaches | Edge transfer lithography: Compatible with standard microfabrication facilities, low cost but lengthy process and high risk of contamination | Nanoimprinting and advanced nanolithography: Require advanced facilities but have low contamination risk and good fabrication throughput and high cost |
4 | Dielectric insulation | Thermal SiO2: Compatible with standard fabrication process, low intrinsic defects but unstable in long-term measurement in liquid | High-k materials: Additional fabrication complexity and prone to interface defects but excellent durability and stability in long-term measurement |
5 | Electrical contact formation | Ohmic contacts: Standard process, requires ion-implantation at the contact areas and sensitive to temperature | Silicide contacts: Require stringent control in metal deposition and annealing steps but provide excellent electrical contacts and no requirement for ion-implantation |
6 | Microfluidics integration | Active microfluidics: Simple fabrication, operation and integration with SiNW FETs but require external power source or pump | Passive microfluidics: Compatible with POC applications, low cost, low or zero energy consumption but careful design and fabrication required to control sample flow and integration with NW FETs |
8 | Readout | Multi channels: Multiplexed sensing capabilities. Mainly custom built based on the specific specification of the SiNW FETs. Require compromise between resolution/functionality and cost | Single channel: Commercial read out available offering high resolution and universal functionality but bulky, expensive and not compatible for multiplex and POC sensing |
Sensing Type | Fabrication Approach | Probe | Analyte | LOD | Ref. |
---|---|---|---|---|---|
Gas, VOCs | Nano imprinting, bottom-up synthesis | Bare, Silane | NO2, VOCs | 20 ppb | [155,156,157,158] |
Ions | Advanced lithography, nanoimprinting | Bare, chelated protein, aptamer | H+, Ca2+, K+ | 1 µM | [29,159,160,161] |
Small molecules | Size reduction, advanced lithography, edge transfer | Glucose oxidase, benzylphosphonic acid-4-boronic acid pinnacol ester, phenylboronic acid, aptamer | Glucose, dopamine | 1 fM | [162,163,164,165,166] |
Genetic materials | Size reduction, advanced lithography | DNA, PNA, aptamer | DNA, cDNA, RNA | 0.1 fM | [148,153,167,168] |
Protein markers | Nanoimprinting, Size reduction, advanced lithography | Antibody | Protein | 30 aM | [12,108,169] |
Pathogen | Advanced lithography, bottom-up synthesis | Antibody | Bacteria toxin, virus materials, virus particles | 1 fM | [97,141,142,143,170] |
Cell, tissue, organ | Nanoimprinting, bottom-up synthesis | Fibronectin, silane | Cardiac cells, neural cell/tissue, heart | N/A | [112,171,172,173,174] |
Company | Product | Detection Targets | Format | Ref. |
---|---|---|---|---|
Vista therapeutics, Inc. (US) | NanoBioSensor™ | Cancer markers, viruses, biological toxin, DNA/RNA | Sample collection/Prep Kits; NanoCards; Readout devices | [182] |
QuantuMDx, (UK) | Q-POC™ | Cancer marker, bacteria, virus, DNA/RNA | Sample cartridge; readout device | [183] |
Nanosens, B.V. (The Netherlands) | Nanowire in various materials, nanowire on-chip | Under development | Wafer-scale nanowires; chip-unit | [184] |
Inanobio, LLC. (US) | Fully depleted exponentially coupled SiNW FET on-chip | Under development. Co-develop with medical devices company | Wafer-scale nanowires; chip-unit | [185] |
Tracense (Israel) | TESS explosives trace detector | Gas sensing platforms for explosive, chemical and biological warfare agents detection | Detection unit: nanowire chip; readout device | [186] |
Avails Medical, Inc. (US) | Under-development | Drug monitoring in saliva | Under-development | [187] |
NanoIVD, Inc. (US) | Under-development | Genetic mutation detection | Test cartridge | [188] |
miDIAGNOSTICS (Belgium) | Under-development | Proteins, nucleic acids, and small molecules | Under-development | [189] |
BiomedX | Under-development | electrolytes, proteins, and blood gases | Under-development | [190] |
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Tran, D.P.; Pham, T.T.T.; Wolfrum, B.; Offenhäusser, A.; Thierry, B. CMOS-Compatible Silicon Nanowire Field-Effect Transistor Biosensor: Technology Development toward Commercialization. Materials 2018, 11, 785. https://doi.org/10.3390/ma11050785
Tran DP, Pham TTT, Wolfrum B, Offenhäusser A, Thierry B. CMOS-Compatible Silicon Nanowire Field-Effect Transistor Biosensor: Technology Development toward Commercialization. Materials. 2018; 11(5):785. https://doi.org/10.3390/ma11050785
Chicago/Turabian StyleTran, Duy Phu, Thuy Thi Thanh Pham, Bernhard Wolfrum, Andreas Offenhäusser, and Benjamin Thierry. 2018. "CMOS-Compatible Silicon Nanowire Field-Effect Transistor Biosensor: Technology Development toward Commercialization" Materials 11, no. 5: 785. https://doi.org/10.3390/ma11050785
APA StyleTran, D. P., Pham, T. T. T., Wolfrum, B., Offenhäusser, A., & Thierry, B. (2018). CMOS-Compatible Silicon Nanowire Field-Effect Transistor Biosensor: Technology Development toward Commercialization. Materials, 11(5), 785. https://doi.org/10.3390/ma11050785