Characterization of Oxide Film of Implantable Metals by Electrochemical Impedance Spectroscopy
Abstract
:1. Introduction
2. Materials and Methods
2.1. Materials
2.2. FE-TEM Observation of Oxide Film
2.3. Electrochemical Model of Oxide Film
2.4. EIS Measurements
3. Results and Discussion
3.1. FE-TEM Analysis of Oxide Films
3.2. EIS Analysis of Oxide Films
4. Conclusions
Funding
Conflicts of Interest
References
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Alloy | Zr | Nb | Ta | Al | V | Pd | Fe | O | N | H | C | Ti |
---|---|---|---|---|---|---|---|---|---|---|---|---|
Ti-15-4-4 | 16.55 | 4.0 | 3.9 | − | − | < 0.01 | 0.04 | 0.28 | 0.09 | 0.0012 | 0.007 | Bal. |
Ti-15-4-1 | 17.24 | 3.97 | 1.67 | − | − | 0.02 | 0.036 | 0.29 | 0.096 | 0.0027 | 0.011 | Bal. |
Ti-15-4 | 17.1 | 4.2 | − | − | − | < 0.01 | 0.026 | 0.28 | < 0.01 | < 0.001 | < 0.01 | Bal. |
C.P. Ti G-4 | − | − | − | − | − | − | 0.197 | 0.275 | 0.003 | 0.0069 | 0.011 | Bal. |
Ti-6-4 | − | − | − | 6.4 | 4.4 | − | 0.10 | 0.07 | 0.02 | 0.0027 | 0.025 | Bal. |
Cr | Mo | Ni | Cu | C | N | Mn | Si | P | Be | Fe | Co | |
Stainless steel | 18.33 | 3.48 | 14.56 | < 0.01 | 0.021 | 0.157 | 1.77 | 0.79 | 0.016. | 0.0014 | Bal. | − |
Co-Cr-Mo | 27.82 | 6.23 | 0.51 | − | 0.26 | − | 0.6 | 0.6 | − | − | 0.68 | Bal. |
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Okazaki, Y. Characterization of Oxide Film of Implantable Metals by Electrochemical Impedance Spectroscopy. Materials 2019, 12, 3466. https://doi.org/10.3390/ma12213466
Okazaki Y. Characterization of Oxide Film of Implantable Metals by Electrochemical Impedance Spectroscopy. Materials. 2019; 12(21):3466. https://doi.org/10.3390/ma12213466
Chicago/Turabian StyleOkazaki, Yoshimitsu. 2019. "Characterization of Oxide Film of Implantable Metals by Electrochemical Impedance Spectroscopy" Materials 12, no. 21: 3466. https://doi.org/10.3390/ma12213466