Oluwabi, A.T.; Gaspar, D.; Katerski, A.; Mere, A.; Krunks, M.; Pereira, L.; Oja Acik, I.
Influence of Post-UV/Ozone Treatment of Ultrasonic-Sprayed Zirconium Oxide Dielectric Films for a Low-Temperature Oxide Thin Film Transistor. Materials 2020, 13, 6.
https://doi.org/10.3390/ma13010006
AMA Style
Oluwabi AT, Gaspar D, Katerski A, Mere A, Krunks M, Pereira L, Oja Acik I.
Influence of Post-UV/Ozone Treatment of Ultrasonic-Sprayed Zirconium Oxide Dielectric Films for a Low-Temperature Oxide Thin Film Transistor. Materials. 2020; 13(1):6.
https://doi.org/10.3390/ma13010006
Chicago/Turabian Style
Oluwabi, Abayomi Titilope, Diana Gaspar, Atanas Katerski, Arvo Mere, Malle Krunks, Luis Pereira, and Ilona Oja Acik.
2020. "Influence of Post-UV/Ozone Treatment of Ultrasonic-Sprayed Zirconium Oxide Dielectric Films for a Low-Temperature Oxide Thin Film Transistor" Materials 13, no. 1: 6.
https://doi.org/10.3390/ma13010006
APA Style
Oluwabi, A. T., Gaspar, D., Katerski, A., Mere, A., Krunks, M., Pereira, L., & Oja Acik, I.
(2020). Influence of Post-UV/Ozone Treatment of Ultrasonic-Sprayed Zirconium Oxide Dielectric Films for a Low-Temperature Oxide Thin Film Transistor. Materials, 13(1), 6.
https://doi.org/10.3390/ma13010006