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Journal: Materials, 2020
Volume: 13
Number: 2008
Article:
Structural, Optical and Electrical Properties of HfO2 Thin Films Deposited at Low-Temperature Using Plasma-Enhanced Atomic Layer Deposition
Authors:
by
Kyoung-Mun Kim, Jin Sub Jang, Soon-Gil Yoon, Ju-Young Yun and Nak-Kwan Chung
Link:
https://www.mdpi.com/1996-1944/13/9/2008
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