Adhesion Studies of CrC/a-C:H Coatings Deposited with Anode Assisted Reactive Magnetron Sputtering Combined with DC-Pulsed Plasma Enhanced Chemical Vapor Deposition
Abstract
:1. Introduction
2. Materials and Methods
2.1. Film Preparation
2.2. Film Characterization
3. Results and Discussion
4. Conclusions
Author Contributions
Funding
Institutional Review Board Statement
Informed Consent Statement
Data Availability Statement
Conflicts of Interest
References
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Process Parameters | Unit | CrC | a-C:H |
---|---|---|---|
Pressure | [Pa] | 0.3 | 1.2 |
Ar flow | [sccm] | Pressure control | - |
C2H2 flow | [sccm] | 0–30 | Pressure control |
Cathode power | [W/cm2] | 10 | - |
Bias Voltage | [V] | −100, 250 kHz, 1.2 µs | −600, 120 kHz, 1.2 µs |
Time | [s] | 2400 | 7200 |
Coating | Adhesion Class | Lc1 [N] | Lc2 [N] | Lc3 [N] |
---|---|---|---|---|
CrC0/a-C:H | HF6 | - | 1.1 | 5.6 |
CrC5/a-C:H | HF2 | 27.9 | 20.3 | 56.0 |
CrC10/a-C:H | HF2 | - | 13.7 | 68.1 |
CrC15/a-C:H | HF1 | 43.4 | 41.0 | 74.0 |
CrC20/a-C:H | HF1 | 48.7 | 58.3 | 73.9 |
CrC25/a-C:H | HF3 | - | 21.6 | 34.1 |
CrC30/a-C:H | HF6 | - | 15.2 | 22.4 |
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Huang, Z.; Chen, Z.; Lang, W.; Wang, X. Adhesion Studies of CrC/a-C:H Coatings Deposited with Anode Assisted Reactive Magnetron Sputtering Combined with DC-Pulsed Plasma Enhanced Chemical Vapor Deposition. Materials 2021, 14, 2954. https://doi.org/10.3390/ma14112954
Huang Z, Chen Z, Lang W, Wang X. Adhesion Studies of CrC/a-C:H Coatings Deposited with Anode Assisted Reactive Magnetron Sputtering Combined with DC-Pulsed Plasma Enhanced Chemical Vapor Deposition. Materials. 2021; 14(11):2954. https://doi.org/10.3390/ma14112954
Chicago/Turabian StyleHuang, Zhihong, Zhijie Chen, Wenchang Lang, and Xianghong Wang. 2021. "Adhesion Studies of CrC/a-C:H Coatings Deposited with Anode Assisted Reactive Magnetron Sputtering Combined with DC-Pulsed Plasma Enhanced Chemical Vapor Deposition" Materials 14, no. 11: 2954. https://doi.org/10.3390/ma14112954