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Open AccessArticle
The Effect of Sodium Hexametaphosphate on the Dispersion and Polishing Performance of Lanthanum–Cerium-Based Slurry
by
Yan Mei
Yan Mei 1,
Wenjuan Chen
Wenjuan Chen 1 and
Xuean Chen
Xuean Chen 2,*
1
College of Materials Science and Engineering, Beijing University of Technology, 100124 Beijing, China
2
Key Laboratory of Advanced Functional Materials, Ministry of Education of China, College of Materials Science and Engineering, Beijing University of Technology, 100124 Beijing, China
*
Author to whom correspondence should be addressed.
Materials 2024, 17(19), 4901; https://doi.org/10.3390/ma17194901 (registering DOI)
Submission received: 5 September 2024
/
Revised: 2 October 2024
/
Accepted: 2 October 2024
/
Published: 6 October 2024
Abstract
A lanthanum–cerium-based abrasive composed of CeO2, LaOF, and LaF3 was commercially obtained. The effect of sodium hexametaphosphate (SHMP) on powder dispersion behavior was systematically investigated using the combined techniques of liquid contact angle, turbidity, zeta potential (ZP), scanning electron microscopy (SEM), powder X-ray diffraction (XRD) combined with Rietveld refinements, X-ray photoelectron spectroscopy (XPS), and polishing tests. The results indicated that the addition of 0.5 wt.% SHMP dispersant to the 5 wt.% lanthanum–cerium-based slurry produced the most stable suspension with a high turbidity of 2715 NTU and a low wetting angle of 45°. The as-obtained slurry displayed good surface polishing quality for K9 glass, with low surface roughness (Ra) of 0.642 and 0.515 nm (in the range of 979 × 979 μm2) at pH = 6 and 11, respectively, which corresponds to the fact that it has local maximum absolute values of ZP at these two pH values. SEM images demonstrated that after appropriate grafting of SHMP, the particle aggregation was reduced and the slurry’s dispersion stability was improved. In addition, the dispersion mechanism was explained based on the principle of complexation reaction, which reveals that the dispersant SHMP can increase the interparticle steric hindrance and electrostatic repulsions. In an acidic environment, steric hindrance dominates, while electrostatic repulsion prevails under alkaline conditions. As expected, this polishing slurry may find potential applications in manufacturing optical devices and integrated circuits.
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MDPI and ACS Style
Mei, Y.; Chen, W.; Chen, X.
The Effect of Sodium Hexametaphosphate on the Dispersion and Polishing Performance of Lanthanum–Cerium-Based Slurry. Materials 2024, 17, 4901.
https://doi.org/10.3390/ma17194901
AMA Style
Mei Y, Chen W, Chen X.
The Effect of Sodium Hexametaphosphate on the Dispersion and Polishing Performance of Lanthanum–Cerium-Based Slurry. Materials. 2024; 17(19):4901.
https://doi.org/10.3390/ma17194901
Chicago/Turabian Style
Mei, Yan, Wenjuan Chen, and Xuean Chen.
2024. "The Effect of Sodium Hexametaphosphate on the Dispersion and Polishing Performance of Lanthanum–Cerium-Based Slurry" Materials 17, no. 19: 4901.
https://doi.org/10.3390/ma17194901
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