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Journal: MaterialsVolume: 18Number: 3659
Article: Synergistic Multi-Mechanism Enhancement in Chemomechanical Abrasive Polishing of Polycrystalline Diamond via a New SiO2–Diamond Slurry in High-Concentration H2O2 Solution
- Authors:
- Xin Zheng,
- Ke Zheng and
- Jie Gao*
- et al.
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