Almaev, A.V.; Yakovlev, N.N.; Almaev, D.A.; Verkholetov, M.G.; Rudakov, G.A.; Litvinova, K.I.
High Oxygen Sensitivity of TiO2 Thin Films Deposited by ALD. Micromachines 2023, 14, 1875.
https://doi.org/10.3390/mi14101875
AMA Style
Almaev AV, Yakovlev NN, Almaev DA, Verkholetov MG, Rudakov GA, Litvinova KI.
High Oxygen Sensitivity of TiO2 Thin Films Deposited by ALD. Micromachines. 2023; 14(10):1875.
https://doi.org/10.3390/mi14101875
Chicago/Turabian Style
Almaev, Aleksei V., Nikita N. Yakovlev, Dmitry A. Almaev, Maksim G. Verkholetov, Grigory A. Rudakov, and Kristina I. Litvinova.
2023. "High Oxygen Sensitivity of TiO2 Thin Films Deposited by ALD" Micromachines 14, no. 10: 1875.
https://doi.org/10.3390/mi14101875
APA Style
Almaev, A. V., Yakovlev, N. N., Almaev, D. A., Verkholetov, M. G., Rudakov, G. A., & Litvinova, K. I.
(2023). High Oxygen Sensitivity of TiO2 Thin Films Deposited by ALD. Micromachines, 14(10), 1875.
https://doi.org/10.3390/mi14101875