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Article

Reversibly Alterable Hot-Electron Photodetection Without Altering Working Wavelengths Through Phase-Change Material Sb2S3

1
School of Physical Science and Technology & Guangxi Key Laboratory of Nuclear Physics and Technology, Guangxi Normal University, Guilin 541004, China
2
University Engineering Research Center of Advanced Functional Materials and Intelligent Sensing, Guilin 541004, China
3
School of Politics and Public Administration, Guangxi Normal University, Guilin 541004, China
*
Authors to whom correspondence should be addressed.
These authors contributed equally to this work.
Micromachines 2025, 16(2), 146; https://doi.org/10.3390/mi16020146
Submission received: 28 November 2024 / Revised: 18 January 2025 / Accepted: 24 January 2025 / Published: 26 January 2025
(This article belongs to the Special Issue Advanced Photodetectors: Materials, Design and Applications)

Abstract

:
Generally, the responsivities of hot-electron photodetectors (HE PDs) are mainly dependent on the device working wavelengths. Therefore, a common approach to altering device responsivities is to change the working wavelengths. Another strategy for manipulating electrical performances of HE PDs is to harness electric bias that can be used to regulate hot-electron harvesting at specified working wavelengths. However, the reliance on bias hampers the flexibility in device operations. In this study, we propose a purely planar design of HE PDs that contains the phase-change material Sb2S3, realizing reversibly alterable hot-electron photodetection without altering the working wavelengths. Optical simulations show that the designed device exhibits strong absorptance (>0.95) at the identical resonance wavelengths due to the excitations of Tamm plasmons (TPs), regardless of Sb2S3 phases. Detailed electrical calculations demonstrate that, by inducing Sb2S3 transitions between crystalline and amorphous phases back and forth, the device responsivities at TP wavelengths can be reversibly altered between 59.9 nA/mW to 128.7 nA/mW. Moreover, when device structural parameters are variable and biases are involved, the reversibly alterable hot-electron photodetection at specified TP wavelengths is maintained.

1. Introduction

Extracting energetic carriers (e.g., hot electrons) generated in metals has been shown to provide promising benefits to a number of photonic technologies, such as photovoltaics [1,2], photocatalysis [3,4], and photodetection [5,6]. In particular, despite extremely low internal quantum efficiencies (IQEs), hot-electron photodetection has been attracting great attention due to its salient capabilities of room-temperature operation [7], gap-free detection [8], and ultra-short responding time [9]. In practice, in order to generate abundant populations of hot electrons to be harvested further, various nanostructured hot-electron harvesting junctions have been explored to strongly capture massive photons in metallic materials through the resonant light–matter interactions [10,11,12,13,14,15,16]. However, nanostructured hot-electron photodetectors (HE PDs) often require complicated/costly fabrications and can hardly overcome the difficulties in large-scale applications [17]. In contrast, with the aid of optical excitations in multi-layer thin film stacks, including Fabry–Pérot resonances [17,18,19] and Tamm plasmons (TPs) [20,21,22], planar HE PDs exhibit clear advantages in cost-effective fabrication and large-area applications.
Over the past decade, several HE PDs with different planar architectures have been deeply studied to achieve two primary objectives, namely, customized spectral responses and enhanced IQEs, as briefly presented in the following. Motivated by realizing planar broadband hot-electron photoelectric conversion, high refractive index absorbable materials, such as Cr [23], Pt [24], Ti [25], and TiN [26], have been employed to efficiently capture light energies over a wide wavelength range. Recently, it has been demonstrated that, when planar metal–dielectric-metal junctions were inserted between two distributed Bragg reflectors (DBRs), HE PDs exhibited ultranarrow responsivity bandwidths as low as 0.4 nm due to the excitations of coupled dual TPs [27]. On the other hand, several strategies aimed at boosting device IQEs by fundamentally manipulating hot-electron dynamics have been exploited, including the engineering of the electronic density of states of metals to raise the proportions of above-barrier hot electrons [28,29], the adoptions of ultrathin absorbable film to suppress hot-electron transport losses [30,31], and multi-junction designs to increase hot-electron collection paths [32,33].
In spite of the aforementioned progresses, reversibly altering the electrical outputs of planar HE PDs at specified working wavelengths is still a challenge. Basically, the responsivities of HE PDs are primarily determined by the device working wavelengths through two factors. One is the wavelength-dependent absorption efficiency in metals. Planar HE PDs often operate at the wavelengths associated with maximum absorptance in metals, guaranteeing to harvest as many photoexcited hot electrons as possible. The other is the wavelength-dependent IQE. The negative correlation between working wavelengths and IQEs can be described by the well-known Fowler equation, imposing limitations on device electrical performances even with perfect absorptions [10]. Therefore, for those planar HE PDs that have already been fabricated, the absorption spectra are determinate and the responsivities at specified operating wavelengths are unalterable. In practice, external electrical voltages applied to hot-electron harvesting junctions can be used to regulate the hot-electron collection efficiencies, resulting in continuously variable responsivities at specified working wavelengths. However, the reliance on electrical bias may reduce the flexibility in device operations and probably lead to an unfavorable increase in dark currents [11]. In consequence, an alternative approach to realizing alterable and reversible planar hot-electron photoelectric conversion without altering working wavelengths and applying bias is highly desired.
The phase-change material Sb2S3 has been used to alter the resonance wavelengths of HE PDs due to its salient capabilities of an ultra-short switching time (~70 ns), phase stability at room temperature, and large bandgap [34,35]. In this work, we demonstrated a Sb2S3-involved route to reversibly alter device responsivity at specified working wavelengths through changing Sb2S3 phases. We designed a planar TP-based HE PD in which the barrier heights of hot-electron harvesting junctions are determined by Sb2S3 phases. Optical simulations revealed that the TP wavelength (945 nm) and TP-induced strong absorption (>0.95) are independent of the Sb2S3 phases, albeit with obvious distinctions in the refractive indexes of two different Sb2S3 phases. In contrast, electrical calculations show that the device responsivities at 945 nm can be reversibly altered between 59.9 nA/mW and 128.7 nA/mW by inducing Sb2S3 phase transitions back and forth. When variable structural parameters and the effects of electric bias are taken into account, the designed device has strong robustness in reversibly alterable photoelectric conversion. Our study forecasts more degrees of freedom in the operation of hot-electron devices.

2. Results and Discussion

As schematically shown in Figure 1a, the designed HE PD consists of a planar Au-Sb2S3-Au junction and a DBR that is composed of eight pairs of alternatively arranged TiO2 and SiO2 layers. The designed device is mounted on a silica substrate. Both Au layers serve as absorbers and electrodes simultaneously. The electrode intermediate layer is made of Sb2S3 that possesses crystalline (Cry) and amorphous (Amp) phases between which suitable opto-thermal or electro-thermal treatments can be carried out to induce transitions reversibly [34]. The bottom Au layer has a thickness of 100 nm, and the Sb2S3 layer has a thickness of 5 nm. The thickness of the top Au layer is denoted by d1. The TiO2 layer, which is adjacent to the top Au layer, is denoted by d2. Unless specifically indicated, the thicknesses of TiO2 and SiO2 layers in the DBR are 105 nm and 155 nm, respectively. Figure 1b displays that the operation of the designed device relies on three electronic processes within the Au-Sb2S3-Au junction, i.e., hot-electron generation, transport, and collection. Specifically, the energy depositions of incident light in the two Au layers result in the electronic transitions from occupied levels below the Fermi level (EF) to higher unoccupied levels, generating non-equilibrium electrons whose energy distributions deviate substantially from equilibrium Fermi–Dirac distributions [8]. Thus, these energetic electrons would experience ultrafast thermalizations within dozens of femtoseconds and diffuse to Au-Sb2S3 interfaces simultaneously [36]. The transport losses are determined by the distances of hot electrons to the Au-Sb2S3 interfaces and the hot-electron energies (Ee) exceeding EF. Upon arriving at the two interfaces, hot electrons would come up against the Au-Sb2S3 barrier, whose height (Φb) is related to the phases of Sb2S3 (Φb = 0.57 eV for Cry phase and Φb = 0.35 eV for Amp phase) [35]. Among them, above-barrier (Ee > Φb) hot electrons have a chance of entering the Sb2S3 layer and then reaching the counter electrode, accompanied by Ee-dependent interfacial losses. However, below-barrier (i.e., Ee < Φb) hot electrons would be blocked. The net hot electrons collected by the two electrodes contribute to a steady-state photocurrent with the aid of an external circuit.
First of all, we examined the reflection spectra of the designed device with the finite element method, as shown in Figure 2a. For comparison, the reflection spectrum of a bare DBR mounted on the same silica substrate was also plotted. It was found that, for both Sb2S3 phases, there is a reflection dip at 945 nm that lies in the DBR forbidden band, indicating the excitations of TPs [7]. In other words, although the Sb2S3 refractive index difference between Cry and Amp phases is approximately 0.5 [35], the phase change of Sb2S3 has a negligible impact on the device optical responses since the Sb2S3 layer is ultrathin. To gain more insights into the two TP excitations, we investigated the spatial distributions of electric field intensity (|E|) at 945 nm, normalized to the electric field intensity (|E0|) of the incident light, as shown in Figure 2b. We found that, as an interfacial optical excitation, TP resonances result in prominent field enhancements (i.e., |E/E0| > 1) around the interface between the DBR and the Au-Sb2S3-Au junction, probably leading to energy depositions in the two absorbable Au layers. Figure 2c,d depict the wavelength-dependent absorption efficiencies in the top (Atop) and bottom (Abot) Au layers when Sb2S3 exhibits the Cry and Amp phases, respectively. The spectra of total (Atotal) and net (Anet) absorptions are also shown. Atotal and Anet are expressed by Atotal = Atop + Abot and Atotal = AtopAbot, respectively. We found the following: (1) the absorption spectra for Sb2S3 in both Cry and Amp phases are nearly identical; (2) TPs induce strong absorptions in Au layers (Atotal > 0.95 at 945 nm); and (3) the absorptions in the two Au layers are asymmetric (Atop > Abot and Anet > 0).
To investigate the spectral tunability of the designed device, when d2 is fixed at 105 nm and d1 increases from 10 nm to 70 nm, we studied the wavelength-dependent Atotal in the cases of Cry- and Amp-phase Sb2S3, as depicted in Figure 3a and Figure 3b, respectively. It was found that, for both Sb2S3 phases, the increases in d1 result in slight blueshifts of TP wavelengths and strong TP absorption efficiencies are maintained. Figure 3c,d show that, when d1 is fixed at 20 nm and d2 increases beginning from 70 nm, TP wavelengths undergo redshifts regardless of Sb2S3 phases. Moreover, two additional absorption bands appear when d2 increases further, indicating the excitations of high-order TPs. Anyway, it is convenient to tailor the optical responses by adjusting the structural parameters (d1 and d2).
To reveal the underlying physics governing TP excitations, we investigated the accumulation of phase shifts resulting from the reflection at the interface between the Au-Sb2S3-Au junction and the DBR. Specifically, we employed the transfer matrix method to calculate the phase shift (α1) caused by the light reflection off the DBR in a TiO2 medium, as shown in Figure 4a. The phase shift (α2) originating from the light reflection off the Au-Sb2S3-Au junction in a TiO2 medium was also calculated, as shown in Figure 4b. Based on α1 and α2, we obtained the interfacial phase accumulation (α), which can be expressed by α = α1 + α2. The wavelength-dependent α, normalized by 2π, is closely related to d1 and d2, as shown in Figure 4c–f, in which six contour lines represent α = 0 or α = 1. Interestingly, we found that the contour lines (α = 0) in Figure 4c,d are perfectly consistent with the absorption bands that are depicted in Figure 3a and Figure 3b, respectively. Similarly, when d2 increases from 70 nm to 370 nm, the absorption bands in Figure 3c and Figure 3d correspond to the contour lines that are depicted in Figure 4e and Figure 4f, respectively. In brief, we have offered quantitative evidence to suggest the phase matching condition allowing for TP excitations [26] that can be described by
α = 2 k π         k = 0 , 1 , 2
On the basis of sufficient optical investigations, electrical assessments of the designed HE PDs are feasible using a well-established model. In this model, the power for any wavelength of the incident light was normalized to be 1 W and the electronic processes for hot-electron harvesting were quantitatively treated [7,11]. When Sb2S3 is in the Cry and Amp phases, we calculated the wavelength-dependent fluxes (Ngen) of the generated hot electrons in different Au layers, as can be seen in Figure 5a and Figure 5b, respectively. It was found that the populations of TP-induced hot-electrons per second in the top Au layer are larger than those in the bottom Au layer. This is because TP-induced absorptions in the top Au layer are larger than that in the bottom Au layer for both Sb2S3 phases. Meanwhile, the hot-electron generation rates are in direct proportion to the absorption efficiencies. By accounting for hot-electron transport losses within the Au layers and interfacial losses at the two Au-Sb2S3 interfaces, we obtained the wavelength-dependent IQEs that were defined as a ratio of the fluxes (Ncol) of collected hot electrons to Ngen, as shown in Figure 5c,d. Evidently, the IQEs decrease with the increase in wavelength due to the reduction in proportion of above-barrier hot electrons. In addition, the IQEs from the top to bottom Au layers in the case of Amp-phase Sb2S3 are larger than that in the case of Cry-phase Sb2S3 due to the decreased barrier height. This trend is also observed when calculating the IQEs from the bottom to top Au layers. As a result, although the Ngen values at the TP wavelengths are nearly identical for both Sb2S3 phases, the Sb2S3 phase transition dramatically affects the fluxes (Nnet) of the net collected hot electrons, which can be calculated by subtracting the Ncol of the top to bottom Au layers from the Ncol of the bottom to top Au layers, as shown in Figure 5e. As expected, the Nnet at 945 nm for Cry-phase Sb2S3 is less than that under the circumstance of Sb2S3 in the Amp phase. Figure 5f displays the calculated responsivity spectra for both Sb2S3 phases. It is suggested that the device responsivities at 954 nm can be reversibly altered between 59.9 nA/mW and 128.7 nA/mW by inducing Sb2S3 transition, back and forth, between the Cry and Amp phases.
Finally, we assessed the robustness of reversibly alterable hot-electron photodetection when the structural parameters of the designed device are variable and the external electric voltage (Vapp) between the two Au electrodes becomes involved in hot-electron extraction. As shown in Figure 6a, for both Sb2S3 phases, the peak responsivities initially increase and then decrease as d1 increases from 10 nm to 70 nm, with d2 fixed at 105 nm. This is because the increase in d1 results in the increase in Anet at the TP wavelengths, enhancing the asymmetric hot-electron generation between the two Au layers. However, with the further increase in d1, substantial hot-electron transport losses would offset the benefits from the increase in Anet. Figure 6b shows that, with d1 fixed at 20 nm, the clear distinctions in peak responsivities between Cry- and Amp-phase Sb2S3 are maintained for different TP wavelengths as d2 increases from 70 nm to 130 nm. Besides d1 and d2, electric bias (Vapp) can also be employed to tune the hot-electron harvesting by adjusting the effective barrier height of the Au-Sb2S3 interface, as shown in Figure 6c. Detailed calculations reveal that, at a TP wavelength of 945 nm, a positive Vapp boosts device responsivity, while a negative Vapp degrades electrical performances, as shown in Figure 6d. Overall, in many cases, the designed device has displayed reversibly alterable photoelectric conversion at specific working wavelengths.

3. Conclusions

Although it is easy to assume that the barrier heights of hot-electron harvesting junctions are tunable for alterable device responsivities, the relevant designs of HE PDs lack feasible routes [29]. In this work, we have demonstrated a planar design of TP-based HE PDs in which an ultrathin Sb2S3 layer is sandwiched between two Au layers, forming a Au-Sb2S3-Au junction. Detailed optical calculations revealed that Sb2S3 phase transitions have negligible impacts on the optical responses of the designed device from the perspectives of both the TP wavelengths and TP-induced absorption efficiencies. However, the responsivities at the TP wavelengths can be reversibly altered by inducing a phase transition between Cry- and Amp-phase Sb2S3 due to the different barrier heights of the Au-Sb2S3-Au junction. Further studies have clarified that the reversibly alterable photodetection sustains regardless of structural parameters and electric bias. It is believed that, besides electric bias, phase-change materials are feasible candidates for altering responsivities at specified working wavelengths and provide progress for the applications of infrared techniques [37,38].

Author Contributions

Conceptualization Y.L. and X.Y.; methodology and software, J.H. (Jia Hao); formal analysis and investigation, Q.Z.; resources, J.H. (Junhui Hu); data curation, Y.L.; writing—original draft preparation, W.S.; writing—review and editing, W.S. All authors have read and agreed to the published version of the manuscript.

Funding

This research was supported by the Central Government Guidance Funds for Local Scientific and Technological Development, China (Guike ZY22096024); the Guangxi Technology Base and Talent Subject (Guike AD23026274); the National Natural Science Foundation of China (62465005); and the Innovation Project of Guangxi Graduate Education (XYCSR2024083).

Data Availability Statement

The raw data supporting the conclusions of this article will be made available by the authors upon request.

Acknowledgments

The authors greatly acknowledge the Guangxi Key Laboratory of Nuclear Physics and Technology, Guangxi Normal University.

Conflicts of Interest

The authors declare no conflicts of interest.

References

  1. Leenheer, A.J.; Narang, P.; Lewis, N.S.; Atwater, H.A. Solar energy conversion via hot electron internal photoemission in metallic nanostructures: Efficiency estimates. J. Appl. Phys. 2014, 115, 134301. [Google Scholar] [CrossRef]
  2. Zhang, Y.; Yam, C.; Schatz, G.C. Fundamental limitations to plasmonic hot-carrier solar cells. J. Appl. Phys. 2016, 7, 1852–1858. [Google Scholar] [CrossRef] [PubMed]
  3. Mubeen, S.; Lee, J.; Singh, N.; Krämer, S.; Stucky, G.D.; Moskovits, M. An autonomous photosynthetic device in which all charge carriers derive from surface plasmons. Nat. Nanotechnol. 2013, 8, 247–251. [Google Scholar] [CrossRef] [PubMed]
  4. Lee, S.W.; Kim, J.M.; Park, W.; Lee, H.; Lee, G.R.; Jung, Y.; Jung, Y.S.; Park, J.Y. Controlling hot electron flux and catalytic selectivity with nanoscale metal-oxide interfaces. Nat. Commun. 2021, 12, 40. [Google Scholar] [CrossRef]
  5. Tagliabue, G.; Jermyn, A.S.; Sundararaman, R.; Welch, A.J.; DuChene, J.S.; Pala, R.; Davoyan, A.R.; Narang, P.; Atwater, H.A. Quantifying the role of surface plasmon excitation and hot carrier transport in plasmonic devices. Nat. Commun. 2018, 9, 3394. [Google Scholar] [CrossRef] [PubMed]
  6. Wang, W.; Besteiro, L.V.; Yu, P.; Lin, F.; Govorov, A.O.; Xu, H.; Wang, Z. Plasmonic hot-electron photodetection with quasi-bound states in the continuum and guided resonances. Nanophotonics 2021, 10, 1911–1921. [Google Scholar] [CrossRef]
  7. Zhang, C.; Wu, K.; Giannini, V.; Li, X. Planar hot-electron photodetection with Tamm plasmons. ACS Nano 2017, 11, 1719–1727. [Google Scholar] [CrossRef]
  8. Reddy, H.; Wang, K.; Kudyshev, Z.; Zhu, L.; Yan, S.; Vezzoli, A.; Higgins, S.J.; Gavini, V.; Boltasseva, A.; Reddy, P.; et al. Determining plasmonic hot-carrier energy distributions via single-molecule transport measurements. Science. 2020, 369, 423–426. [Google Scholar] [CrossRef] [PubMed]
  9. Schirato, A.; Maiuri, M.; Cerullo, G.; Della Valle, G. Ultrafast hot electron dynamics in plasmonic nanostructures: Experiments, modelling, design. Nanophotonics 2023, 12, 1–28. [Google Scholar] [CrossRef]
  10. Knight, M.W.; Wang, Y.; Urban, A.S.; Sobhani, A.; Zheng, B.Y.; Nordlander, P.; Halas, N.J. Embedding plasmonic nanostructure diodes enhances hot electron emission. Nano Lett. 2013, 13, 1687–1692. [Google Scholar] [CrossRef]
  11. Chalabi, H.; Schoen, D.; Brongersma, M.L. Hot-electron photodetection with a plasmonic nanostripe antenna. Nano Lett. 2014, 14, 1374–1380. [Google Scholar] [CrossRef] [PubMed]
  12. Li, W.; Valentine, J. Metamaterial perfect absorber based hot electron photodetection. Nano Lett. 2014, 14, 3510–3514. [Google Scholar] [CrossRef] [PubMed]
  13. Ratchford, D.C.; Dunkelberger, A.D.; Vurgaftman, I.; Owrutsky, J.C.; Pehrsson, P.E. Quantification of efficient plasmonic hot-electron injection in gold nanoparticle−TiO2 films. Nano Lett. 2017, 17, 6047–6055. [Google Scholar] [CrossRef] [PubMed]
  14. Hu, X.; Li, F.; Wu, H.; Liu, W. Suppression of gap plasmon resonance for high-responsivity metal–insulator–metal near-infrared hot-electron photodetectors. Opt. Lett. 2022, 47, 42–45. [Google Scholar] [CrossRef]
  15. Hu, X.-L.; Wu, H.-L.; Tang, L.-Y.; Zhang, J.; Liu, W.-J. High-responsivity dual-frequency hot-electron photodetectors with magnetic polaritons beneath metal grating strips. J. Phys. D Appl. Phys. 2023, 56, 125101. [Google Scholar] [CrossRef]
  16. Hu, X.-L.; Li, F.; Xu, S.-H.; Liu, W.-J. Design of a binary metal micron grating and its application in near-infrared hot-electron photodetectors. Opt. Lett. 2023, 48, 4033–4036. [Google Scholar] [CrossRef] [PubMed]
  17. Zhan, Y.; Wu, K.; Zhang, C.; Wu, S.; Li, X. Infrared hot-carrier photodetection based on planar perfect absorber. Opt. Lett. 2015, 40, 4261–4264. [Google Scholar] [CrossRef] [PubMed]
  18. Zhang, C.; Wu, K.; Zhan, Y.; Giannini, V.; Li, X. Planar microcavity-integrated hot-electron photodetector. Nanoscale 2016, 8, 10323–10329. [Google Scholar] [CrossRef]
  19. Shao, W.; Yang, Q.; Zhang, C.; Wu, S.; Li, X. Planar dual-cavity hot-electron photodetectors. Nanoscale 2019, 11, 1396–1402. [Google Scholar] [CrossRef]
  20. Yu, T.; Zhang, C.; Liu, H.; Liu, J.; Li, K.; Qin, L.; Wu, S.; Li, X. Planar, narrowband, and tunable photodetection in the near-infrared with Au/TiO2 nanodiodes based on Tamm plasmons. Nanoscale 2020, 11, 23182–23187. [Google Scholar] [CrossRef] [PubMed]
  21. Zhu, Y.; Yu, P.; Liu, T.; Xu, H.; Govorov, A.O.; Wang, Z. Nanolayered Tamm plasmon-based multicolor hot electron photodetection for O- and C-band telecommunication. ACS Appl. Electron. Mater. 2021, 3, 639–650. [Google Scholar] [CrossRef]
  22. Shao, W.; Cui, W.; Hu, J.; Wang, Y.; Tang, J.; Li, X. Planar hot-electron photodetection with polarity-switchable photocurrents controlled by the working wavelength. Opt. Express 2023, 31, 25220–25229. [Google Scholar] [CrossRef] [PubMed]
  23. Krayer, L.J.; Tennyson, E.M.; Leite, M.S.; Munday, J.N. Near-IR imaging based on hot carrier generation in nanometer-scale optical coatings. ACS Photonics 2018, 5, 306–311. [Google Scholar] [CrossRef]
  24. Krayer, L.J.; Kim, J.; Garrett, J.L.; Munday, J.N. Optoelectronic devices on index-near-zero substrates. ACS Photonics 2019, 6, 2238–2244. [Google Scholar] [CrossRef]
  25. Zhang, C.; Liu, T.; Li, L.; Wu, S.; Wang, C.; Li, X. Planar dual-layer system for ultra-broadband absorption and hot-carrier photodetection in longwave near-Infrared band. IEEE J. Sel. Top. Quant. Electron. 2022, 28, 3800109. [Google Scholar] [CrossRef]
  26. Wang, J.; Zhu, Y.; Wang, W.; Li, Y.; Gao, R.; Yu, P.; Xu, H.; Wang, Z. Broadband Tamm plasmon-enhanced planar hot-electron photodetector. Nanoscale 2020, 12, 23945–23952. [Google Scholar] [CrossRef] [PubMed]
  27. Liang, W.; Xiao, Z.; Xu, H.; Deng, H.; Li, H.; Chen, W.; Liu, Z.; Long, Y. Ultranarrow-bandwidth planar hot electron photodetector based on coupled dual Tamm plasmons. Opt. Express 2020, 28, 31330–31344. [Google Scholar] [CrossRef]
  28. Gong, T.; Munday, J.N. Materials for hot carrier plasmonics. Opt. Mater. Express 2015, 5, 2501–2512. [Google Scholar] [CrossRef]
  29. Zhang, C.; Cao, G.; Wu, S.; Shao, W.; Giannini, V.; Maier, S.A.; Li, X. Thermodynamic loss mechanisms and strategies for efficient hot-electron photoconversion. Nano Energy 2019, 55, 164–172. [Google Scholar] [CrossRef]
  30. Jin, Y.; Seok, J.; Yu, K. Highly efficient silicon-based thin-film Schottky barrier photodetectors. ACS Photonics 2023, 10, 1302–1309. [Google Scholar] [CrossRef]
  31. Zheng, J.-R.; You, E.-M.; Hu, Y.-F.; Yi, J.; Tian, Z.-Q. Ultrabroadband hot-hole photodetector based on ultrathin gold film. Nanoscale 2023, 15, 8863–8869. [Google Scholar] [CrossRef] [PubMed]
  32. Zhu, Y.; Yu, P.; Ashalley, E.; Liu, T.; Lin, F.; Ji, H.; Takahara, J.; Govorov, A.; Wang, Z. Planar hot-electron photodetector utilizing high refractive index MoS2 in Fabry–Pérot perfect absorber. Nanotechnology 2020, 31, 274001. [Google Scholar] [CrossRef] [PubMed]
  33. Yang, X.; Wang, Y.; Li, Y.; Cui, W.; Hu, J.; Zhou, Q.; Shao, W. High-performance planar broadband hot-electron photodetection through platinum–dielectric triple junctions. Nanomaterials 2024, 14, 1552. [Google Scholar] [CrossRef]
  34. Chamoli, S.K.; Verma, G.; Singh, S.C.; Guo, C. Phase change material based hot electron photodetection. Nanoscale 2021, 13, 1311–1317. [Google Scholar] [CrossRef] [PubMed]
  35. Santos, G.; Georghe, M.; Cobianu, C.; Modreanu, M.; Losurdo, M.; Gutiérrez, Y.; Moreno, F. Plasmonic hot-electron reconfigurable photodetector based on phase-change material Sb2S3. Opt. Express 2022, 30, 38953–38965. [Google Scholar] [CrossRef]
  36. Narang, P.; Sundararaman, R.; Atwater, H.A. Plasmonic hot carrier dynamics in solid-state and chemical systems for energy conversion. Nanophotonics 2016, 5, 96–111. [Google Scholar] [CrossRef]
  37. Rao, C.; Zhong, L.; Guo, Y.; Li, M.; Zhang, L.; Wei, K. Astronomical adaptive optics: A review. PhotoniX 2024, 5, 16. [Google Scholar] [CrossRef]
  38. Sun, J.; Kuschmierz, R.; Katz, O.; Koukourakis, N.; Czarske, J.W. Lensless fiber endomicroscopy in biomedicine. PhotoniX 2024, 5, 18. [Google Scholar] [CrossRef]
Figure 1. (a) Schematic of the designed device. (b) Energy diagram of Au-Sb2S3-Au junction for hot-electron harvesting.
Figure 1. (a) Schematic of the designed device. (b) Energy diagram of Au-Sb2S3-Au junction for hot-electron harvesting.
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Figure 2. (a) Wavelength-dependent reflectivity of the bare DBR and the designed device for Cry- and Amp-phase Sb2S3. (b) Spatial distributions of normalized electric fields (|E/E0|) at TP wavelength of 945 nm. Wavelength-dependent absorption contributions of the designed device when Sb2S3 exhibits (c) Cry and (d) Amp phases. During calculation, d1 = 20 nm and d2 = 105 nm.
Figure 2. (a) Wavelength-dependent reflectivity of the bare DBR and the designed device for Cry- and Amp-phase Sb2S3. (b) Spatial distributions of normalized electric fields (|E/E0|) at TP wavelength of 945 nm. Wavelength-dependent absorption contributions of the designed device when Sb2S3 exhibits (c) Cry and (d) Amp phases. During calculation, d1 = 20 nm and d2 = 105 nm.
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Figure 3. For d2 = 105 nm, the wavelength-dependent Atotal as a function of d1 under the circumstances of (a) Sb2S3 Cry and (b) Amp phases are shown. For d1 = 20 nm, the contour maps of Atotal when d2 increases from 70 nm to 370 nm for (c) Cry- and (d) Amp-phase Sb2S3 are shown.
Figure 3. For d2 = 105 nm, the wavelength-dependent Atotal as a function of d1 under the circumstances of (a) Sb2S3 Cry and (b) Amp phases are shown. For d1 = 20 nm, the contour maps of Atotal when d2 increases from 70 nm to 370 nm for (c) Cry- and (d) Amp-phase Sb2S3 are shown.
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Figure 4. Schematics for the calculations of phase shifts, i.e., α1 and α2, due to the reflections off the (a) Au-Sb2S3-Au junction and (b) DBR in a TiO2 medium, respectively. Wavelength-dependent phase accumulations (α = α1 + α2) as a function of d1, ranging from 10 nm to 70 nm, when Sb2S3 is in the (c) Cry and (d) Amp phases. Contour maps of α when d2 increases from 70 nm to 370 nm for (e) Cry- and (f) Amp-phase Sb2S3.
Figure 4. Schematics for the calculations of phase shifts, i.e., α1 and α2, due to the reflections off the (a) Au-Sb2S3-Au junction and (b) DBR in a TiO2 medium, respectively. Wavelength-dependent phase accumulations (α = α1 + α2) as a function of d1, ranging from 10 nm to 70 nm, when Sb2S3 is in the (c) Cry and (d) Amp phases. Contour maps of α when d2 increases from 70 nm to 370 nm for (e) Cry- and (f) Amp-phase Sb2S3.
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Figure 5. (a) Spectra of the fluxes (Ngen) of the generated hot electrons when Sb2S3 is in the (a) Cry and (b) Amp phases. For both Sb2S3 phases, the wavelength-dependent internal quantum efficiencies (IQEs) from (c) bottom to top Au layers and (d) from top to bottom electrodes are shown. (e) The spectra of calculated fluxes (Nnet) of the net collected hot electrons and (f) the predicted responsivities as a function of wavelength under two circumstances of Sb2S3 Cry and Amp phases.
Figure 5. (a) Spectra of the fluxes (Ngen) of the generated hot electrons when Sb2S3 is in the (a) Cry and (b) Amp phases. For both Sb2S3 phases, the wavelength-dependent internal quantum efficiencies (IQEs) from (c) bottom to top Au layers and (d) from top to bottom electrodes are shown. (e) The spectra of calculated fluxes (Nnet) of the net collected hot electrons and (f) the predicted responsivities as a function of wavelength under two circumstances of Sb2S3 Cry and Amp phases.
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Figure 6. For both Sb2S3 phases, the TP-induced responsivities as a function of (a) d1 and (b) d2 are shown. d2 is fixed at 105 nm in (a) and d1 is fixed at 20 nm in (b). (c) The energy diagram of Au-Sb2S3-Au junction when external electrical voltage (Vapp) is applied between two Au electrodes. Eft (Efb) is the Fermi level of the top (bottom) Au layer. (d) Vapp-dependent responsivities at 945 nm for different Sb2S3 phases, where d1 = 20 nm and d2 = 105 nm.
Figure 6. For both Sb2S3 phases, the TP-induced responsivities as a function of (a) d1 and (b) d2 are shown. d2 is fixed at 105 nm in (a) and d1 is fixed at 20 nm in (b). (c) The energy diagram of Au-Sb2S3-Au junction when external electrical voltage (Vapp) is applied between two Au electrodes. Eft (Efb) is the Fermi level of the top (bottom) Au layer. (d) Vapp-dependent responsivities at 945 nm for different Sb2S3 phases, where d1 = 20 nm and d2 = 105 nm.
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MDPI and ACS Style

Li, Y.; Yang, X.; Hao, J.; Hu, J.; Zhou, Q.; Shao, W. Reversibly Alterable Hot-Electron Photodetection Without Altering Working Wavelengths Through Phase-Change Material Sb2S3. Micromachines 2025, 16, 146. https://doi.org/10.3390/mi16020146

AMA Style

Li Y, Yang X, Hao J, Hu J, Zhou Q, Shao W. Reversibly Alterable Hot-Electron Photodetection Without Altering Working Wavelengths Through Phase-Change Material Sb2S3. Micromachines. 2025; 16(2):146. https://doi.org/10.3390/mi16020146

Chicago/Turabian Style

Li, Yaoyao, Xiaoyan Yang, Jia Hao, Junhui Hu, Qingjia Zhou, and Weijia Shao. 2025. "Reversibly Alterable Hot-Electron Photodetection Without Altering Working Wavelengths Through Phase-Change Material Sb2S3" Micromachines 16, no. 2: 146. https://doi.org/10.3390/mi16020146

APA Style

Li, Y., Yang, X., Hao, J., Hu, J., Zhou, Q., & Shao, W. (2025). Reversibly Alterable Hot-Electron Photodetection Without Altering Working Wavelengths Through Phase-Change Material Sb2S3. Micromachines, 16(2), 146. https://doi.org/10.3390/mi16020146

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