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Research on Deflection and Stress Analyses and the Improvement of the Removal Uniformity of Silicon in a Single-Sided Polishing Machine Under Pressure
 
 

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Journal: Micromachines, 2025
Volume: 16
Number: 450

Article: Research on the Trajectory and Relative Speed of a Single-Sided Chemical Mechanical Polishing Machine
Authors: by Guoqing Ye and Zhenqiang Yao
Link: https://www.mdpi.com/2072-666X/16/4/450

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