MDPI and ACS Style
Sun, K.; Pigot, C.; Chen, H.; Nechab, M.; Gigmes, D.; Morlet-Savary, F.; Graff, B.; Liu, S.; Xiao, P.; Dumur, F.;
et al. Free Radical Photopolymerization and 3D Printing Using Newly Developed Dyes: Indane-1,3-Dione and 1H-Cyclopentanaphthalene-1,3-Dione Derivatives as Photoinitiators in Three-Component Systems. Catalysts 2020, 10, 463.
https://doi.org/10.3390/catal10040463
AMA Style
Sun K, Pigot C, Chen H, Nechab M, Gigmes D, Morlet-Savary F, Graff B, Liu S, Xiao P, Dumur F,
et al. Free Radical Photopolymerization and 3D Printing Using Newly Developed Dyes: Indane-1,3-Dione and 1H-Cyclopentanaphthalene-1,3-Dione Derivatives as Photoinitiators in Three-Component Systems. Catalysts. 2020; 10(4):463.
https://doi.org/10.3390/catal10040463
Chicago/Turabian Style
Sun, Ke, Corentin Pigot, Hong Chen, Malek Nechab, Didier Gigmes, Fabrice Morlet-Savary, Bernadette Graff, Shaohui Liu, Pu Xiao, Frédéric Dumur,
and et al. 2020. "Free Radical Photopolymerization and 3D Printing Using Newly Developed Dyes: Indane-1,3-Dione and 1H-Cyclopentanaphthalene-1,3-Dione Derivatives as Photoinitiators in Three-Component Systems" Catalysts 10, no. 4: 463.
https://doi.org/10.3390/catal10040463