Suppression of Hydrophobic Recovery in Photo-Initiated Chemical Vapor Deposition
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Aufoujal, A.; Legrand, U.; Meunier, J.-L.; Tavares, J.R. Suppression of Hydrophobic Recovery in Photo-Initiated Chemical Vapor Deposition. Catalysts 2020, 10, 534. https://doi.org/10.3390/catal10050534
Aufoujal A, Legrand U, Meunier J-L, Tavares JR. Suppression of Hydrophobic Recovery in Photo-Initiated Chemical Vapor Deposition. Catalysts. 2020; 10(5):534. https://doi.org/10.3390/catal10050534
Chicago/Turabian StyleAufoujal, Alessio, Ulrich Legrand, Jean-Luc Meunier, and Jason Robert Tavares. 2020. "Suppression of Hydrophobic Recovery in Photo-Initiated Chemical Vapor Deposition" Catalysts 10, no. 5: 534. https://doi.org/10.3390/catal10050534
APA StyleAufoujal, A., Legrand, U., Meunier, J.-L., & Tavares, J. R. (2020). Suppression of Hydrophobic Recovery in Photo-Initiated Chemical Vapor Deposition. Catalysts, 10(5), 534. https://doi.org/10.3390/catal10050534