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Article

Suppression of Hydrophobic Recovery in Photo-Initiated Chemical Vapor Deposition

by
Alessio Aufoujal
1,
Ulrich Legrand
1,
Jean-Luc Meunier
2 and
Jason Robert Tavares
1,*
1
Research Center for High Performance Polymer and Composite Systems (CREPEC), Department of Chemical Engineering Department, Polytechnique Montreal, Montreal, QC H3C 3A7, Canada
2
Plasma Processing Laboratory, Department of Chemical Engineering, McGill University, Montreal, QC H3A 2B2, Canada
*
Author to whom correspondence should be addressed.
Catalysts 2020, 10(5), 534; https://doi.org/10.3390/catal10050534
Submission received: 9 April 2020 / Revised: 8 May 2020 / Accepted: 11 May 2020 / Published: 12 May 2020
(This article belongs to the Special Issue Photocatalysis and Environment)

Abstract

Photo-initiated chemical vapor deposition (PICVD) functionalizes carbon nanotube (CNT)-enhanced porous substrates with a highly polar polymeric nanometric film, rendering them super-hydrophilic. Despite its ability to generate fully wettable surfaces at low temperatures and atmospheric pressure, PICVD coatings normally undergo hydrophobic recovery. This is a process by which a percentage of oxygenated functional group diffuse/re-arrange from the top layer of the deposited film towards the bulk of the substrate, taking the induced hydrophilic property of the material with them. Thus, hydrophilicity decreases over time. To address this, a vertical chemical gradient (VCG) can be deposited onto the CNT-substrate. The VCG consists of a first, thicker highly cross-linked layer followed by a second, thinner highly functionalized layer. In this article, we show, through water contact angle and XPS measurements, that the increased cross-linking density of the first layer can reduce the mobility of polar functional groups, forcing them to remain at the topmost layer of the PICVD coating and to suppress hydrophobic recovery. We show that employing a bi-layer VCG suppresses hydrophobic recovery for five days and reduces its effect afterwards (contact angle stabilizes to 42 ± 1° instead of 125 ± 3°).
Keywords: hydrophobic recovery; photochemistry; superhydrophilicity; homogenous catalysis hydrophobic recovery; photochemistry; superhydrophilicity; homogenous catalysis

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MDPI and ACS Style

Aufoujal, A.; Legrand, U.; Meunier, J.-L.; Tavares, J.R. Suppression of Hydrophobic Recovery in Photo-Initiated Chemical Vapor Deposition. Catalysts 2020, 10, 534. https://doi.org/10.3390/catal10050534

AMA Style

Aufoujal A, Legrand U, Meunier J-L, Tavares JR. Suppression of Hydrophobic Recovery in Photo-Initiated Chemical Vapor Deposition. Catalysts. 2020; 10(5):534. https://doi.org/10.3390/catal10050534

Chicago/Turabian Style

Aufoujal, Alessio, Ulrich Legrand, Jean-Luc Meunier, and Jason Robert Tavares. 2020. "Suppression of Hydrophobic Recovery in Photo-Initiated Chemical Vapor Deposition" Catalysts 10, no. 5: 534. https://doi.org/10.3390/catal10050534

APA Style

Aufoujal, A., Legrand, U., Meunier, J.-L., & Tavares, J. R. (2020). Suppression of Hydrophobic Recovery in Photo-Initiated Chemical Vapor Deposition. Catalysts, 10(5), 534. https://doi.org/10.3390/catal10050534

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