Microstructures, Mechanical Behavior, and Radiation Damage of (TiVCr)x-(TaW)1-x Binary System High-Entropy Alloy Films

Round 1

Reviewer 1 Report

The Authors of the paper „Microstructures, Mechanical Behavior, and Radiation Damage of
(TiVCr)x-(TaW)1-x Binary System High-entropy Alloy Films” undertake the interesting subject. The manuscript is clearly presented and well organized. The investigation methodology is consistent with this type of investigation, and there are some useful results which can form the basis for publication. I feel that the paper deserves publication.

But the paper needs some corrections:

• There are some syntax and typing errors in the text. Please revise it carefully.

Author Response

Dear professor,

Thanks for your advise. I modified the paper per your comments.

The syntax and typing errors in the text have been corrected.

Best regards,

Chunxia Jiang

Reviewer 2 Report

Authors have performed mainly synthesis and various characterization of Binary system alloy. Structural and mechanical study is interesting and scientifically sound. I would suggest to some re-formatting like Figure 1. I would recommend its publication with minor revision. I only have concern that why traditional thin film growth is not appropriate? Can you please clarify more?

Author Response

Dear professor,

Thanks for your advise.

I modified the paper per your comments.

1.The figure has been reformatted per figure 1.

2.Grammar and spelling mistakes in the article have been corrected. 

3.By using dual-target co-sputtering, the composition ratio of the thin film can be adjusted by changing the voltage between the two targets. If a single target is used for sputtering, the elemental composition ratio in the thin film cannot be adjusted.

Best regards

Chuxia Jiang