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Journal: Appl. Sci., 2021
Volume: 11
Number: 2110
Article:
Low-Temperature and Low-Pressure Silicon Nitride Deposition by ECR-PECVD for Optical Waveguides
Authors:
by
Dawson B. Bonneville, Jeremy W. Miller, Caitlin Smyth, Peter Mascher and Jonathan D. B. Bradley
Link:
https://www.mdpi.com/2076-3417/11/5/2110
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