Tien, C.-L.; Chiang, C.-Y.; Wang, Y.-L.; Wang, C.-C.; Lin, S.-C.
Surface Roughness, Residual Stress, and Optical and Structural Properties of Evaporated VO2 Thin Films Prepared with Different Tungsten Doping Amounts. Appl. Sci. 2025, 15, 9457.
https://doi.org/10.3390/app15179457
AMA Style
Tien C-L, Chiang C-Y, Wang Y-L, Wang C-C, Lin S-C.
Surface Roughness, Residual Stress, and Optical and Structural Properties of Evaporated VO2 Thin Films Prepared with Different Tungsten Doping Amounts. Applied Sciences. 2025; 15(17):9457.
https://doi.org/10.3390/app15179457
Chicago/Turabian Style
Tien, Chuen-Lin, Chun-Yu Chiang, Yi-Lin Wang, Ching-Chiun Wang, and Shih-Chin Lin.
2025. "Surface Roughness, Residual Stress, and Optical and Structural Properties of Evaporated VO2 Thin Films Prepared with Different Tungsten Doping Amounts" Applied Sciences 15, no. 17: 9457.
https://doi.org/10.3390/app15179457
APA Style
Tien, C.-L., Chiang, C.-Y., Wang, Y.-L., Wang, C.-C., & Lin, S.-C.
(2025). Surface Roughness, Residual Stress, and Optical and Structural Properties of Evaporated VO2 Thin Films Prepared with Different Tungsten Doping Amounts. Applied Sciences, 15(17), 9457.
https://doi.org/10.3390/app15179457