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Journal: Applied SciencesVolume: 9Number: 1275
Article: Mitigating the Impact of Mask Absorber Error on Lithographic Performance by Lithography System Holistic Optimization
  • Authors:
  • Naiyuan Sheng,
  • Enze Li and
  • Lihui Liu
  • et al.
Link: https://www.mdpi.com/2076-3417/9/7/1275

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